18592405. PELLICLE ASSEMBLY MOUNTING FOR LITHOGRAPHY MASK (Taiwan Semiconductor Manufacturing Company, Ltd.)

PELLICLE ASSEMBLY MOUNTING FOR LITHOGRAPHY MASK

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor(s)

Kun-Lung Hsieh of Hsinchu TW

Hao-En Luo of Hsinchu TW

Shang-Cheng Tsai of Hsinchu TW

Chih-Wei Wen of Hsinchu TW

PELLICLE ASSEMBLY MOUNTING FOR LITHOGRAPHY MASK

This abstract first appeared for US patent application 18592405 titled 'PELLICLE ASSEMBLY MOUNTING FOR LITHOGRAPHY MASK

Original Abstract Submitted

An extreme ultraviolet mask including a substrate, a reflective multilayer stack on the substrate and patterned absorber layer on the reflective multilayer stack is provided with a pellicle membrane frame attached to the substrate. In some embodiments, the pellicle membrane frame is attached to the substrate using an adhesive between the pellicle membrane frame and the substrate. In some embodiments, the pellicle membrane frame is located in a trench formed in the reflective multilayer stack and patterned absorber layer. In other embodiments, the pellicle membrane frame not located in a trench formed in the reflective multilayer stack and patterned absorber layer.