18921277. RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME AND MULTILAYERED STRUCTURES FORMED USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME AND MULTILAYERED STRUCTURES FORMED USING THE SAME
Organization Name
Inventor(s)
CHANGYOUNG Jeong of Suwon-si KR
RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME AND MULTILAYERED STRUCTURES FORMED USING THE SAME
This abstract first appeared for US patent application 18921277 titled 'RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME AND MULTILAYERED STRUCTURES FORMED USING THE SAME
Original Abstract Submitted
A resist composition includes an alkylated tin-oxo nanocluster and a compound having Lewis basicity. The alkylated tin-oxo nanocluster includes a core structure including tin oxide, and an alkyl group of 1 to 20 carbon atoms, combined with the tin element of the core structure. The compound includes a polymer or an organic single molecule, having a functional group that functions as a Lewis base, and the functional group is a functional group containing lone pair electrons.
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