Jump to content

18927195. SPIN CHUCK AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)

From WikiPatents
Revision as of 09:48, 2 May 2025 by Wikipatents (talk | contribs) (Creating a new page)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)


SPIN CHUCK AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Hyunchul Kim of Suwon-si KR

Ohchel Kwon of Suwon-si KR

Daewoong Choi of Suwon-si KR

Hyunmo Kang of Suwon-si KR

Jinhong Park of Suwon-si KR

Wooseok Choe of Suwon-si KR

SPIN CHUCK AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

This abstract first appeared for US patent application 18927195 titled 'SPIN CHUCK AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

Original Abstract Submitted

A spin chuck includes an upper plate having an upper surface and a lower surface, the upper plate including a groove and a support pin on the upper surface of the upper plate, wherein the support pin is configured to support a substrate; an anti-slip plate below the upper plate, the anti-slip plate having an upper surface and a lower surface, wherein the anti-slip plate includes a first protrusion protruding in a vertical direction from the upper surface of the anti-slip plate toward the upper plate; and a lower plate below the anti-slip plate, the lower plate including a chucking pin configured to fix the substrate, wherein the lower plate has an upper surface and a lower surface, wherein the first protrusion of the anti-slip plate is coupled to the groove of the upper plate.

(Ad) Transform your business with AI in minutes, not months

Custom AI strategy tailored to your specific industry needs
Step-by-step implementation with measurable ROI
5-minute setup that requires zero technical skills
Get your AI playbook

Trusted by 1,000+ companies worldwide

Cookies help us deliver our services. By using our services, you agree to our use of cookies.