Taiwan semiconductor manufacturing company, ltd. (20250130367). WAVEGUIDE PHOTODETECTOR AND METHOD FOR FORMING THE SAME

WAVEGUIDE PHOTODETECTOR AND METHOD FOR FORMING THE SAME

Organization Name

taiwan semiconductor manufacturing company, ltd.

Inventor(s)

Chih-Tsung Shih of Hsinchu City TW

Chi-Yuan Shih of Hsinchu TW

WAVEGUIDE PHOTODETECTOR AND METHOD FOR FORMING THE SAME

This abstract first appeared for US patent application 20250130367 titled 'WAVEGUIDE PHOTODETECTOR AND METHOD FOR FORMING THE SAME

Original Abstract Submitted

a waveguide photodetector includes a slab over a substrate, first and second contact portions protruding upward from the slab, and a ridge protruding upward from the slab between the first and second contact portions. a first semiconductor layer is over the substrate and includes a first doped region in the first contact portion, a second doped region in the slab between the first contact portion and the ridge, a third doped region and a sixth doped region in the ridge, a fourth doped region in the second contact portion, a fifth doped region in the slab between the second contact portion and the ridge, a first intrinsic region between the sixth and third doped regions, and a second intrinsic region between the sixth and fifth doped regions. a second semiconductor layer is over the first intrinsic region and between the sixth and third doped regions.