18611138. METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Hsiang-Chien Hsu of Hsinchu TW
METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS
This abstract first appeared for US patent application 18611138 titled 'METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS
Original Abstract Submitted
A method for repairing a lithography mask is provided. The method includes receiving a lithography mask having a capping layer that includes a damaged region, identifying a location and a dimension of the damaged region of the capping layer, determining a repairing time duration based on the dimension of the damaged region of the capping layer, and forming a capping patch layer in the damaged region of the capping layer.
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