RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Chanjae Ahn of Suwon-si KR

Myungwoong Kim of Incheon KR

Yoonhyun Kwak of Suwon-si KR

Yunhee Ko of Incheon KR

Seungjun Kim of Incheon KR

RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME

This abstract first appeared for US patent application 20250123564 titled 'RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME

Original Abstract Submitted

provided are a resist composition and a method of forming a pattern by using the same, the resist composition including a polymer including a first repeating unit represented by formula 1, a photoacid generator, and an organic solvent: