18376553. SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME (NANYA TECHNOLOGY CORPORATION)

SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME

Organization Name

NANYA TECHNOLOGY CORPORATION

Inventor(s)

Wei-Chih Wang of Taoyuan City TW

SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME

This abstract first appeared for US patent application 18376553 titled 'SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME

Original Abstract Submitted

Embodiments of this disclosure provide a semiconductor structure including a substrate. The substrate includes active areas and insulation areas between the active areas. A first end of each of the active areas has a first head portion, a second end of each of the active areas has the second head portion, and a middle portion of each of active areas has a waist portion. In a top view, the first head portion and the second head portion of each of the active areas have a first width, respectively, and the waist portion of each of the active areas has a second width. Also, the first width is greater than the second width. Moreover, a method of manufacturing a semiconductor structure also is provided herein.