17944207. Pattern-based depth mapping with extended reference image simplified abstract (Apple Inc.)
Pattern-based depth mapping with extended reference image
Organization Name
Inventor(s)
Shay Yosub of Kfar Yehezkel (IL)
Boris Morgenstein of Tel Aviv (IL)
David Pawlowski of Tel Aviv (IL)
Assaf Avraham of Givatayim (IL)
Pieter Spinnewyn of Los Gatos CA (US)
Yohai Zmora of San Francisco CA (US)
Pattern-based depth mapping with extended reference image - A simplified explanation of the abstract
This abstract first appeared for US patent application 17944207 titled 'Pattern-based depth mapping with extended reference image
Simplified Explanation
The patent application describes a method for depth mapping using a projector and a camera to capture images of a target area.
- The depth mapping device includes a projector and a camera.
- The projector projects a pattern of optical radiation onto the target area.
- The camera captures images of the target area within a narrower field of view.
- The projector and camera are offset transversely relative to each other.
- The camera captures reference images containing parts of the pattern on different planes.
- The reference images are combined to produce an extended reference image.
Potential Applications
This technology could be used in:
- 3D scanning
- Augmented reality
- Robotics
Problems Solved
- Accurate depth mapping
- Improved spatial awareness
- Enhanced object recognition
Benefits
- Higher precision in depth mapping
- Increased efficiency in image capture
- Enhanced visualization capabilities
Potential Commercial Applications
Enhancing Spatial Awareness in Augmented Reality Devices
Original Abstract Submitted
A method for depth mapping includes providing a depth mapping device comprising a projector, which is configured to project a pattern of optical radiation onto a target area over a first field of view about a projection axis, and a camera, which is configured to capture images of the target area within a second field of view, narrower than the first field of view, about a camera axis, which is offset transversely relative to the projection axis. The projector projects the pattern onto first and second planes at first and second distances from the camera, and the camera captures first and second reference images containing first and second parts of the pattern on the first and second planes, respectively. The first and second reference images are combined to produce an extended reference image including both the first and second parts of the pattern.
- Apple Inc.
- Shay Yosub of Kfar Yehezkel (IL)
- Noam Badt of Tel Aviv (IL)
- Boris Morgenstein of Tel Aviv (IL)
- Yuval Vardi of Tel Aviv (IL)
- David Pawlowski of Tel Aviv (IL)
- Assaf Avraham of Givatayim (IL)
- Pieter Spinnewyn of Los Gatos CA (US)
- Tom Levy of Holon (IL)
- Yohai Zmora of San Francisco CA (US)
- G06T7/521
- G06T5/50
- G06V10/141
- G06V10/24
- G06V10/74
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