Samsung electronics co., ltd. (20240425988). APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING UPPER AND LOWER INLETS FOR SUPPLYING SUPERCRITICAL FLUIDS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING UPPER AND LOWER INLETS FOR SUPPLYING SUPERCRITICAL FLUIDS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
Organization Name
Inventor(s)
Yong-Jhin Cho of Hwaseong-si (KR)
APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING UPPER AND LOWER INLETS FOR SUPPLYING SUPERCRITICAL FLUIDS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
This abstract first appeared for US patent application 20240425988 titled 'APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING UPPER AND LOWER INLETS FOR SUPPLYING SUPERCRITICAL FLUIDS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
Original Abstract Submitted
an apparatus for fabricating a semiconductor device includes a chamber accommodating a substrate coated with a first fluid, a lower inlet which is placed in a lower wall of the chamber and providing a first supercritical fluid into the chamber, an upper inlet placed in an upper wall of the chamber and providing a second supercritical fluid into the chamber, a fluid outlet placed in the lower wall of the chamber and discharging a second fluid which is a mixture of the first fluid and the first supercritical fluid to outside of the chamber, and a drain cup placed between the lower wall of the chamber and the substrate, and having a first portion of which a width, in a horizontal direction, decreases toward the lower wall of the chamber, and a second portion which connects the first portion and the fluid outlet to each other.
