18702320. EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE WAVEFORM TO EDGE RING (LAM RESEARCH CORPORATION)
Contents
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE WAVEFORM TO EDGE RING
Organization Name
Inventor(s)
Rajesh Dorai of Pleasanton CA (US)
John Holland of San Jose CA (US)
Pratik Jacob Mankidy of Fremont CA (US)
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE WAVEFORM TO EDGE RING
This abstract first appeared for US patent application 18702320 titled 'EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE WAVEFORM TO EDGE RING
Original Abstract Submitted
A system for etching a wafer is provided. In one example, the system includes a lower electrode and an upper electrode disposed above the lower electrode. The system further includes an edge ring surrounding the lower electrode. The system includes a first radio frequency (RF) generator electrically coupled to the lower electrode and a second radio frequency (RF) generator electrically coupled to the edge ring. The system also includes a direct current (DC) bias generator for electrically supplying an additive DC bias to the edge ring. The system includes a controller interfaced with the first and second RF generators and the DC bias generator. The first RF generator is configured to produce a wafer voltage (V w) waveform at the lower electrode. The produced Vw waveform includes an induced direct current (DC) component and a first RF component produced by the first RF generator. The controller is configured to produce an edge ring voltage (V) waveform for application to the edge ring. The Vwaveform includes the additive DC bias and a second RF component produced by the second RF generator. The Vwaveform is programmed by the controller to have a substantially same frequency and phase as the Vw waveform, a DC offset from the Vw waveform, and an amplitude variation relative to an amplitude of the Vw waveform.
