18210773. SYSTEMS AND METHODS FOR DETERMINING A FLUID HEIGHT AND/OR A FLUID VELOCITY ON A SPINNING SUBSTRATE (Tokyo Electron Limited)
Contents
SYSTEMS AND METHODS FOR DETERMINING A FLUID HEIGHT AND/OR A FLUID VELOCITY ON A SPINNING SUBSTRATE
Organization Name
Inventor(s)
Michael Carcasi of Austin TX (US)
Sean Berglund of Austin TX (US)
Ankur Agarwal of Austin TX (US)
Joshua Hooge of Austin TX (US)
David Hetzer of Albany NY (US)
Robert Brandt of Albany NY (US)
Steven Gueci of Albany NY (US)
SYSTEMS AND METHODS FOR DETERMINING A FLUID HEIGHT AND/OR A FLUID VELOCITY ON A SPINNING SUBSTRATE
This abstract first appeared for US patent application 18210773 titled 'SYSTEMS AND METHODS FOR DETERMINING A FLUID HEIGHT AND/OR A FLUID VELOCITY ON A SPINNING SUBSTRATE
Original Abstract Submitted
Embodiments of processing systems and methods are provided to control operational parameter(s) of a spin-on process based on a fluid height and/or a fluid velocity of a processing liquid dispensed onto a surface of a spinning semiconductor substrate. The disclosed embodiments determine the fluid height and/or the fluid velocity of the processing liquid by: (a) monitoring an intensity of light, which is transmitted through the processing liquid as the processing liquid flows across the surface of the spinning substrate or leaves the periphery of the spinning substrate, or (b) monitoring how long it takes for the processing liquid to flow from a dispensed location to the periphery of the spinning substrate. Once determined, the fluid velocity is used to control one or more operational parameters of a spin-on process.
