18703525. LIQUID CIRCULATION SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND LIQUID CIRCULATION METHOD (Tokyo Electron Limited)
Contents
LIQUID CIRCULATION SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND LIQUID CIRCULATION METHOD
Organization Name
Inventor(s)
Mitsuaki Iwashita of Yamanashi (JP)
Kenji Sekiguchi of Yamanashi (JP)
Koji Akiyama of Yamanashi (JP)
Tamotsu Morimoto of Yamanashi (JP)
Toshikazu Akimoto of Tokyo (JP)
LIQUID CIRCULATION SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND LIQUID CIRCULATION METHOD
This abstract first appeared for US patent application 18703525 titled 'LIQUID CIRCULATION SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND LIQUID CIRCULATION METHOD
Original Abstract Submitted
A liquid circulation system according to an aspect of the present disclosure is for recovering an ionic liquid supplied into a vacuum chamber and returning the recovered ionic liquid back again into the vacuum chamber, and includes a storage tank having an opening communicating with an inside of the vacuum chamber and configured to store the ionic liquid recovered from the inside of the vacuum chamber through the opening, a viscosity pump provided below the storage tank in a vertical direction, and a pipe configured to supply the ionic liquid inside the storage tank into the vacuum chamber.
