18615313. FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVERCOAT (Tokyo Electron Limited)
Contents
FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVERCOAT
Organization Name
Inventor(s)
Michael Murphy of Albany NY (US)
Jacob Dobson of Albany NY (US)
Jodi Grzeskowiak of Albany NY (US)
David Conklin of Saratoga Springs NY (US)
FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVERCOAT
This abstract first appeared for US patent application 18615313 titled 'FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVERCOAT
Original Abstract Submitted
A method includes forming a plurality of first mandrels over a substrate, forming an overcoat layer over the plurality of first mandrels, and inducing a crosslinking reaction within the overcoat layer and form a crosslinked overcoat layer. The method further includes exposing the substrate to a radiation to generate a plurality of acid molecules within the plurality of first mandrels, diffusing a portion of the plurality of acid molecules from the plurality of first mandrels into portions of the crosslinked overcoat layer, and inducing a decrosslinking reaction within the portions of the crosslinked overcoat layer and form de-crosslinked regions. Unmodified regions of the crosslinked overcoat layer form a plurality of second mandrels. The method further includes selectively removing the de-crosslinked regions. The plurality of first mandrels and the plurality of second mandrels form a mandrel pattern over the substrate.
