18808427. ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE (FUJIFILM CORPORATION)
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Organization Name
Inventor(s)
Takeshi Kawabata of Haibara-gun (JP)
Akiyoshi Goto of Haibara-gun (JP)
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
This abstract first appeared for US patent application 18808427 titled 'ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Original Abstract Submitted
A first object of the present invention is to provide an active light ray sensitive or radioactive ray sensitive resin composition having excellent sensitivity and forming a pattern with excellent resolution. A second object of the present invention is to provide a resist film, a pattern-forming method, and a method for manufacturing an electronic device relating to the active light ray sensitive or radioactive ray sensitive resin composition. The active light ray sensitive or radioactive ray sensitive resin composition of the present invention includes a metal compound, a resin having a main chain that is decomposed by irradiation with an X-ray, an electron beam, or an extreme ultraviolet ray, and a solvent, wherein the metal compound includes one or more metal compounds selected from the group consisting of a metal complex, an organic metal salt, and an organic metal compound, and the resin includes a resin including a repeating unit represented by a formula (1) or a repeating unit represented by a formula (XR0).
