18808397. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, COMPOUND, AND RESIN (FUJIFILM CORPORATION)
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, COMPOUND, AND RESIN
Organization Name
Inventor(s)
Tsutomu Yoshimura of Haibara-gun (JP)
Naoya Hatakeyama of Haibara-gun (JP)
Akiyoshi Goto of Haibara-gun (JP)
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, COMPOUND, AND RESIN
This abstract first appeared for US patent application 18808397 titled 'ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, COMPOUND, AND RESIN
Original Abstract Submitted
According to an actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) including a repeating unit (a1) having a partial structure in which a phenolic hydroxy group is protected with a structure represented by a formula (1) below, a pattern in which generation of defects is suppressed can be formed: