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17970788. MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE simplified abstract (Samsung Electronics Co., Ltd.)

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MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Younghyun Kim of Seoul (KR)

Sechung Oh of Yongin-si (KR)

Heeju Shin of Seoul (KR)

Jaehoon Kim of Seoul (KR)

Sanghwan Park of Suwon-si (KR)

Junghwan Park of Seoul (KR)

MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 17970788 titled 'MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE

Simplified Explanation

The abstract describes a magnetoresistive random access memory (MRAM) device that includes several layers and materials to improve its performance.

  • The device includes a pinned layer, a tunnel barrier layer, a free layer structure, and an upper oxide layer.
  • The free layer structure consists of multiple magnetic layers and metal insertion layers placed between them.
  • Each metal insertion layer is made of a non-magnetic metal material that is doped with a magnetic material.
  • The metal insertion layers are spaced apart from each other.

Potential Applications

  • MRAM devices can be used in various electronic devices, such as computers, smartphones, and IoT devices.
  • The improved performance of this MRAM device can enhance the speed and efficiency of data storage and retrieval.

Problems Solved

  • Traditional MRAM devices may have limitations in terms of speed, density, and power consumption.
  • The use of metal insertion layers doped with magnetic material helps to overcome these limitations and improve the performance of the MRAM device.

Benefits

  • The use of metal insertion layers doped with magnetic material enhances the magnetic properties of the MRAM device.
  • This leads to improved performance in terms of speed, density, and power consumption.
  • The device can provide faster data storage and retrieval, higher memory density, and lower power consumption compared to traditional MRAM devices.


Original Abstract Submitted

A magnetoresistive random access memory device includes a pinned layer; a tunnel barrier layer on the pinned layer; a free layer structure on the tunnel barrier layer, the free layer structure including a plurality of magnetic layers and a plurality of metal insertion layers between the magnetic layers; and an upper oxide layer on the free layer structure, wherein each of the metal insertion layers includes a non-magnetic metal material doped with a magnetic material, and the metal insertion layers are spaced apart from each other.

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