Taiwan semiconductor manufacturing company, ltd. (20240381515). APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION simplified abstract
Contents
APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Chun-Lin Chang of Zhubei City (TW)
Li-Jui Chen of Hsinchu City (TW)
Han-Lung Chang of Kaohsiung City (TW)
APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240381515 titled 'APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
The patent application describes an apparatus for generating extreme ultraviolet (EUV) radiation using a droplet generator, an excitation laser, a deformable mirror, and a controller.
- The droplet generator creates target droplets.
- The excitation laser heats the target droplets with excitation pulses to convert them to plasma.
- The deformable mirror is positioned in the path of the excitation laser.
- The controller adjusts the excitation laser parameters by controlling the deformable mirror based on feedback.
Potential Applications: - EUV lithography for semiconductor manufacturing. - Scientific research in plasma physics. - Medical imaging technologies.
Problems Solved: - Efficient generation of EUV radiation. - Precise control of plasma formation. - Enhanced performance in various applications.
Benefits: - Improved resolution in lithography. - Increased accuracy in scientific experiments. - Enhanced imaging capabilities in medical diagnostics.
Commercial Applications: Title: "Advanced EUV Radiation Apparatus for Semiconductor Manufacturing" This technology can be used in semiconductor fabrication facilities to enhance lithography processes, leading to higher quality and more advanced microchips. The market implications include improved productivity and competitiveness in the semiconductor industry.
Questions about EUV Radiation Apparatus: 1. How does the deformable mirror contribute to the efficiency of EUV radiation generation?
The deformable mirror allows for precise control of the excitation laser parameters, optimizing the conversion of target droplets to plasma for EUV radiation generation.
2. What are the key advantages of using EUV radiation in semiconductor manufacturing?
EUV radiation enables higher resolution and more precise patterning in lithography processes, leading to the production of advanced microchips with smaller features.
Original Abstract Submitted
an apparatus for generating extreme ultraviolet (euv) radiation includes a droplet generator configured to generate target droplets. an excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. a deformable mirror is disposed in a path of the excitation laser. a controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.
