Taiwan semiconductor manufacturing company, ltd. (20240379854). Metal Rail Conductors For Non-Planar Semiconductor Devices simplified abstract
Contents
Metal Rail Conductors For Non-Planar Semiconductor Devices
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Chih-Liang Chen of Hsinchu City (TW)
Chih-Ming Lai of Hsinchu City (TW)
Ching-Wei Tsai of Hsinchy City (TW)
Charles Chew -Yuen Young of Cupertino CA (US)
Jiann-Tyng Tzeng of Hsinchu (TW)
Kuo-Cheng Chiang of Zhubei City (TW)
Ru-Gun Liu of Zhubei City (TW)
Wei-Hao Wu of Hsinchu City (TW)
Yi-Hsiung Lin of Zhubei City (TW)
Chia-Hao Chang of Hsinchu City (TW)
Lei-Chun Chou of Taipei City (TW)
Metal Rail Conductors For Non-Planar Semiconductor Devices - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240379854 titled 'Metal Rail Conductors For Non-Planar Semiconductor Devices
The present disclosure discusses non-planar semiconductor devices, such as fin field-effect transistors (FinFETs), with metal rail conductors and methods for fabricating them.
- Metal rail conductors can be electrically connected to gate, source, and/or drain regions of these devices.
- They can facilitate electrical connections between different regions of various semiconductor devices.
- In some cases, the metal rail conductors are isolated from the gate, source, and drain regions to prevent electrical connection.
Potential Applications: - Advanced semiconductor technology - Integrated circuits - Electronics industry
Problems Solved: - Enhancing electrical connections in semiconductor devices - Improving performance and efficiency of electronic components
Benefits: - Increased functionality of semiconductor devices - Enhanced connectivity between different regions - Potential for smaller and more efficient electronic devices
Commercial Applications: Title: Advanced Semiconductor Technology for Enhanced Connectivity This technology can be utilized in the development of cutting-edge electronic devices, leading to improved performance and efficiency in various industries such as telecommunications, computing, and consumer electronics.
Questions about the Technology: 1. How does the use of metal rail conductors improve the performance of non-planar semiconductor devices? 2. What are the potential challenges in implementing this technology on a large scale?
Frequently Updated Research: Researchers are constantly exploring new materials and techniques to further enhance the capabilities of non-planar semiconductor devices, including the integration of metal rail conductors for improved connectivity and performance.
Original Abstract Submitted
the present disclosure describes various non-planar semiconductor devices, such as fin field-effect transistors (finfets) to provide an example, having one or more metal rail conductors and various methods for fabricating these non-planar semiconductor devices. in some situations, the one or more metal rail conductors can be electrically connected to gate, source, and/or drain regions of these various non-planar semiconductor devices. in these situations, the one or more metal rail conductors can be utilized to electrically connect the gate, the source, and/or the drain regions of various non-planar semiconductor devices to other gate, source, and/or drain regions of various non-planar semiconductor devices and/or other semiconductor devices. however, in other situations, the one or more metal rail conductors can be isolated from the gate, the source, and/or the drain regions these various non-planar semiconductor devices. this isolation prevents electrical connection between the one or more metal rail conductors and the gate, the source, and/or the drain regions these various non-planar semiconductor devices.
- Taiwan semiconductor manufacturing company, ltd.
- Chih-Liang Chen of Hsinchu City (TW)
- Chih-Ming Lai of Hsinchu City (TW)
- Ching-Wei Tsai of Hsinchy City (TW)
- Charles Chew -Yuen Young of Cupertino CA (US)
- Jiann-Tyng Tzeng of Hsinchu (TW)
- Kuo-Cheng Chiang of Zhubei City (TW)
- Ru-Gun Liu of Zhubei City (TW)
- Wei-Hao Wu of Hsinchu City (TW)
- Yi-Hsiung Lin of Zhubei City (TW)
- Chia-Hao Chang of Hsinchu City (TW)
- Lei-Chun Chou of Taipei City (TW)
- H01L29/78
- H01L21/768
- H01L21/8234
- H01L23/48
- H01L23/528
- H01L23/535
- H01L27/088
- H01L29/417
- H01L29/66
- CPC H01L29/7851