Taiwan semiconductor manufacturing company, ltd. (20240379785). Protective Liner for Source/Drain Contact to Prevent Electrical Bridging While Minimizing Resistance simplified abstract

Protective Liner for Source/Drain Contact to Prevent Electrical Bridging While Minimizing Resistance

Organization Name

taiwan semiconductor manufacturing company, ltd.

Inventor(s)

Kuo-Chiang Tsai of Hsinchu City (TW)

Hsin-Huang Lin of Hsinchu (TW)

Jyh-Huei Chen of Hsinchu City (TW)

Protective Liner for Source/Drain Contact to Prevent Electrical Bridging While Minimizing Resistance - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240379785 titled 'Protective Liner for Source/Drain Contact to Prevent Electrical Bridging While Minimizing Resistance

The patent application describes a structure where active region structures protrude vertically from a substrate and extend horizontally in a first direction, with source/drain components and contacts placed accordingly.

• Active region structures protrude vertically from a substrate and extend horizontally.
• Source/drain components are positioned over the active region structures.
• Source/drain contacts are placed over the components, consisting of bottom and top portions.
• Protective liners are present on the side surfaces of the top portion of the source/drain contacts.

Potential Applications: - Semiconductor manufacturing - Integrated circuits - Electronic devices

Problems Solved: - Efficient layout of source/drain components - Enhanced protection of source/drain contacts

Benefits: - Improved performance of electronic devices - Enhanced reliability of semiconductor structures

Commercial Applications: Title: "Innovative Semiconductor Structure for Enhanced Performance" This technology can be utilized in the production of advanced electronic devices, leading to improved functionality and durability. The market implications include increased demand for high-performance semiconductor components.

Questions about the technology: 1. How does the protective liner on the source/drain contacts contribute to the overall reliability of the structure? - The protective liner helps prevent damage to the source/drain contacts, ensuring long-term functionality. 2. What are the key advantages of having active region structures protrude vertically from the substrate? - Vertical protrusion allows for efficient use of space and optimized performance in electronic devices.

Original Abstract Submitted

one or more active region structures each protrude vertically out of a substrate in a vertical direction and each extend horizontally in a first horizontal direction. a source/drain component is disposed over the one or more active region structures in the vertical direction. a source/drain contact is disposed over the source/drain component in the vertical direction. the source/drain contact includes a bottom portion and a top portion. a protective liner is disposed on side surfaces of the top portion of the source/drain contact but not on side surfaces of the bottom portion of the source/drain contact.