Taiwan semiconductor manufacturing company, ltd. (20240379675). ACTIVE REGION PATTERNING simplified abstract
Contents
ACTIVE REGION PATTERNING
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Chih-Hsin Yang of Hsinchu (TW)
Yen-Ming Chen of Hsin-Chu County (TW)
ACTIVE REGION PATTERNING - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240379675 titled 'ACTIVE REGION PATTERNING
The abstract of this patent application describes semiconductor structures and fabrication processes involving multiple fins aligned in a specific manner within a semiconductor region.
- A semiconductor structure with multiple fins aligned in a specific manner is provided.
- The structure includes a first region with three fins and a second region with two fins, abutting the first region.
- The fins in the first region are aligned with the fins in the second region, terminating at an interface between the two regions.
Potential Applications: - This technology could be used in the manufacturing of advanced semiconductor devices. - It may find applications in the development of high-performance electronic components.
Problems Solved: - This innovation addresses the need for precise alignment of semiconductor fins in a structure. - It provides a solution for optimizing the performance of semiconductor devices.
Benefits: - Improved efficiency in semiconductor fabrication processes. - Enhanced performance and reliability of semiconductor devices.
Commercial Applications: Title: Advanced Semiconductor Fabrication Technology for Enhanced Device Performance This technology could be utilized in the production of next-generation electronic devices, leading to improved functionality and performance in various industries such as telecommunications, computing, and consumer electronics.
Questions about the technology: 1. How does the alignment of fins in semiconductor structures impact device performance?
- The alignment of fins plays a crucial role in determining the efficiency and performance of semiconductor devices by optimizing electron flow and reducing resistance.
2. What are the potential challenges in implementing this semiconductor structure in mass production?
- Mass production of semiconductor structures with precise fin alignment may require advanced manufacturing techniques and quality control processes to ensure consistency and reliability.
Original Abstract Submitted
semiconductor structures and fabrication processes are provided. a semiconductor according to the present disclosure includes a first region including a first fin, a second fin, and a third fin extending along a first direction, and a second region abutting the first region. the second region includes a fourth fin and a fifth fin extending along the first direction. the first fin is aligned with the fourth fin and the second fin is aligned with the fifth fin. the third fin terminates at an interface between the first region and the second region.
