Taiwan semiconductor manufacturing company, ltd. (20240379652). Revising IC Layout Design to Eliminate Gaps Between Isolation Structures simplified abstract
Contents
Revising IC Layout Design to Eliminate Gaps Between Isolation Structures
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Tun-Jen Chang of Hsinchu City (TW)
Tung-Heng Hsieh of Hsinchu County (TW)
Bao-Ru Young of Hsinchu County (TW)
Revising IC Layout Design to Eliminate Gaps Between Isolation Structures - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240379652 titled 'Revising IC Layout Design to Eliminate Gaps Between Isolation Structures
Simplified Explanation: The patent application describes a method for revising an integrated circuit layout design to eliminate a distance between two circuit components that are abutted together.
- The method involves receiving an IC layout design with two circuit cells containing different IC components.
- If the distance between the components is less than a predefined threshold, the layout design is revised to eliminate the distance.
- This revision ensures that the components are in close proximity to each other in the final layout design.
Key Features and Innovation:
- Optimization of integrated circuit layout design.
- Elimination of distance between circuit components.
- Enhanced proximity of IC components for improved performance.
Potential Applications: This technology can be applied in the semiconductor industry for designing more efficient and compact integrated circuits.
Problems Solved: The technology addresses the issue of suboptimal distances between circuit components in IC layout designs.
Benefits:
- Improved performance of integrated circuits.
- Enhanced efficiency in semiconductor design.
- Reduction of potential signal interference.
Commercial Applications: Potential commercial applications include the production of high-performance electronic devices and systems, as well as advancements in semiconductor manufacturing processes.
Prior Art: Readers can explore prior art related to IC layout design, semiconductor manufacturing, and integrated circuit optimization to gain a deeper understanding of the technology.
Frequently Updated Research: Stay informed about the latest developments in IC layout design, semiconductor technology, and integrated circuit optimization to keep up with industry trends and advancements.
Questions about IC Layout Design: 1. What are the key considerations in optimizing IC layout designs? 2. How does the elimination of distance between circuit components impact the performance of integrated circuits?
Original Abstract Submitted
an integrated circuit (ic) layout design is received that includes a first circuit cell and a second circuit cell abutted to one another. the first circuit cell contains a first ic component, and the second circuit cell contains a second ic component. a determination is made that a distance between the first ic component and the second ic component is less than a predefined threshold when the first circuit cell and the second circuit cell are abutted together. the ic layout design is revised such that the distance between the first ic component and the second ic component is eliminated in the revised ic layout design.
