Taiwan semiconductor manufacturing company, ltd. (20240379464). APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART REPAIR simplified abstract
Contents
APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART REPAIR
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Po-Chien Huang of Hsinchu (TW)
Chung-Hung Lin of Hsinchu (TW)
APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART REPAIR - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240379464 titled 'APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART REPAIR
The abstract describes an artificial intelligence-assisted substrate defect repair apparatus and method that utilizes an object detection algorithm to analyze images and recommend materials for fixing defects.
- Object detection algorithm employed for analyzing images and determining defect type
- Composition and morphology information of defects and objects obtained from images
- Recommendations provided for materials and associated information for defect repair
Potential Applications: - Semiconductor manufacturing - Quality control in industrial processes - Material science research
Problems Solved: - Efficient defect detection and repair - Reduction of manual labor in identifying and fixing defects - Improved quality control in manufacturing processes
Benefits: - Increased productivity and efficiency - Enhanced accuracy in defect repair - Cost savings in manufacturing processes
Commercial Applications: Title: AI-Assisted Defect Repair Technology for Semiconductor Manufacturing Description: This technology can be used in semiconductor manufacturing processes to improve defect repair efficiency and quality control, leading to cost savings and enhanced productivity.
Prior Art: Prior art related to this technology may include research on object detection algorithms in industrial applications and defect repair methods in manufacturing processes.
Frequently Updated Research: Research on advancements in object detection algorithms and materials for defect repair in industrial processes may be relevant to this technology.
Questions about AI-Assisted Defect Repair Technology: 1. How does the object detection algorithm analyze images to determine the type of defect? 2. What are the potential challenges in implementing this technology in different industrial settings?
Original Abstract Submitted
one or more embodiments of the present disclosure describe an artificial intelligence assisted substrate defect repair apparatus and method. the ai assisted defect repair apparatus employs an object detection algorithm. based on the plurality of images taken by detectors located at different respective positions, the detectors capture various views of an object including a defect. the composition information as well as the morphology information (e.g., shape, size, location, height, depth, width, length, or the like) of the defect and the object are obtained based on the plurality of images. the object detection algorithm analyzes the images and determines the type of defect and the recommends a material (e.g., etching gas) and the associated information (e.g., supply time of the etching gas, flow rate of the etching gas, etc.) for fixing the defect.
