Taiwan semiconductor manufacturing company, ltd. (20240379419). SEMICONDUCTOR STRUCTURE HAVING SEAM SEALED simplified abstract

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SEMICONDUCTOR STRUCTURE HAVING SEAM SEALED

Organization Name

taiwan semiconductor manufacturing company, ltd.

Inventor(s)

Yu-Lien Huang of Hsinchu (TW)

Ching-Feng Fu of Hsinchu (TW)

Huan-Just Lin of Hsinchu (TW)

Che-Ming Hsu of Hsinchu (TW)

SEMICONDUCTOR STRUCTURE HAVING SEAM SEALED - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240379419 titled 'SEMICONDUCTOR STRUCTURE HAVING SEAM SEALED

The semiconductor structure described in the patent application includes a gate, a self-aligned contact (SAC) layer with a seam at the top surface, a gate spacer on the gate's sidewall, and a metal contact adjacent to the gate spacer.

  • The SAC layer contains a filler that seals the seam and is coplanar with the gate spacer and metal contact.
  • The gate spacer ensures the metal contact is spaced apart from the gate.
  • The innovation lies in the design and materials used in the SAC layer to improve the structure's performance and reliability.

Potential Applications: - This technology can be used in the manufacturing of advanced semiconductor devices. - It may find applications in the production of high-performance electronic components.

Problems Solved: - Addresses issues related to contact resistance and reliability in semiconductor structures. - Improves the overall performance and longevity of the devices.

Benefits: - Enhanced performance and reliability of semiconductor devices. - Improved contact resistance and overall functionality.

Commercial Applications: Title: Advanced Semiconductor Structures for Enhanced Performance This technology can be utilized in the production of high-performance electronic devices, leading to improved efficiency and reliability in various industries such as telecommunications, computing, and automotive.

Questions about the Technology: 1. How does the filler in the SAC layer contribute to the overall performance of the semiconductor structure?

  The filler in the SAC layer helps seal the seam, ensuring better reliability and functionality of the device.

2. What role does the gate spacer play in the semiconductor structure?

  The gate spacer helps in maintaining the proper spacing between the gate and the metal contact, improving the overall performance of the device.


Original Abstract Submitted

a semiconductor structure includes a gate, a self-aligned contact (sac) layer that is disposed on the gate and that has a seam at a top surface of the sac layer, a gate spacer that is formed on a sidewall of the gate, and a metal contact that is disposed adjacent to the gate spacer and that is spaced apart from the gate by the gate spacer. the sac layer includes a filler that seals the seam in the sac layer, and a top surface of the filler is coplanar with a top surface of the gate spacer and a top surface of the metal contact.