Taiwan semiconductor manufacturing company, ltd. (20240379380). SYSTEMS AND METHODS FOR PROCESSING A SUBSTRATE simplified abstract
Contents
SYSTEMS AND METHODS FOR PROCESSING A SUBSTRATE
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Sheng-Chun Yang of Hsinchu (TW)
Chih-Lung Cheng of Hsinchu (TW)
Min-Cheng Chung of Hsinchu (TW)
SYSTEMS AND METHODS FOR PROCESSING A SUBSTRATE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240379380 titled 'SYSTEMS AND METHODS FOR PROCESSING A SUBSTRATE
The patent application describes a system and method for creating a gas curtain over an access port of a processing chamber for a semiconductor substrate. This gas curtain prevents outside gases, such as oxygen, from entering the chamber when the access port is opened.
- Gas flow stabilizer and gas flow receiver work together to generate the gas curtain.
- The system includes horizontal and vertical flow sections to effectively impede outside gases.
- The technology is designed to maintain a controlled environment within the processing chamber.
- By preventing outside gases from entering, the system helps maintain the purity of the processing environment.
- The gas curtain is particularly useful when adding or removing a workpiece from the processing chamber.
Potential Applications: - Semiconductor manufacturing processes - Clean room environments - Chemical vapor deposition processes
Problems Solved: - Contamination of the processing chamber by outside gases - Maintaining a controlled environment for semiconductor processing
Benefits: - Improved purity of the processing environment - Enhanced reliability of semiconductor manufacturing processes - Increased efficiency in maintaining clean room conditions
Commercial Applications: Title: Gas Curtain System for Semiconductor Processing Chambers This technology can be used in semiconductor manufacturing facilities to enhance the quality and reliability of semiconductor production processes. It can also be valuable in clean room environments where maintaining a controlled atmosphere is crucial for various manufacturing processes.
Questions about Gas Curtain System for Semiconductor Processing Chambers: 1. How does the gas curtain system prevent outside gases from entering the processing chamber? The gas flow stabilizer and gas flow receiver work together to create a barrier that impedes the flow of outside gases into the chamber when the access port is opened.
2. What are the potential benefits of using a gas curtain system in semiconductor manufacturing processes? The benefits include improved purity of the processing environment, enhanced reliability of semiconductor manufacturing processes, and increased efficiency in maintaining clean room conditions.
Original Abstract Submitted
a system and method for generating a gas curtain over an access port of a processing chamber for a semiconductor substrate. a gas flow stabilizer and a gas flow receiver, each including a horizontal flow section and a vertical flow section cooperate to generate a gas curtain that impedes gas, e.g., oxygen, from outside the processing chamber, from flowing into the chamber, for example, when the access port is opened to add/or to remove a workpiece from the processing chamber.
