Taiwan semiconductor manufacturing company, ltd. (20240379333). Ion Beam Etching Apparatus And Method simplified abstract
Contents
Ion Beam Etching Apparatus And Method
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Jung-Hao Chang of Taichung City (TW)
Po-Chin Chang of Taichung City (TW)
Pinyen Lin of Rochester NY (US)
Ion Beam Etching Apparatus And Method - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240379333 titled 'Ion Beam Etching Apparatus And Method
The present disclosure pertains to a semiconductor device manufacturing system with a chamber and an ion source that generates a particle beam. The system also includes a grid structure near the ion source outlet to manipulate the particle beam, with one portion electrically insulated from another.
- The semiconductor device manufacturing system includes a chamber and an ion source that generates a particle beam.
- A grid structure near the ion source outlet manipulates the particle beam.
- The grid structure has electrically insulated portions.
- The system enables precise control and manipulation of the particle beam for semiconductor device manufacturing.
- This innovation enhances the efficiency and accuracy of semiconductor device fabrication processes.
Potential Applications:
- Semiconductor manufacturing industry
- Research and development in the field of nanotechnology
- Advanced materials science applications
Problems Solved:
- Improved control and manipulation of particle beams in semiconductor device manufacturing
- Enhanced precision and accuracy in fabrication processes
Benefits:
- Increased efficiency in semiconductor device manufacturing
- Enhanced control over particle beam manipulation
- Improved quality and performance of semiconductor devices
Commercial Applications: Title: Advanced Semiconductor Device Manufacturing System This technology can be utilized in:
- Semiconductor fabrication facilities
- Research institutions
- Nanotechnology companies
Questions about Semiconductor Device Manufacturing System: 1. How does the grid structure manipulate the particle beam in the semiconductor device manufacturing system? The grid structure near the ion source outlet is designed to control and direct the particle beam, allowing for precise manipulation during the manufacturing process.
2. What are the potential benefits of using an ion source in semiconductor device manufacturing? An ion source enables the generation of a particle beam, which can be utilized for various processes such as etching, deposition, and doping in semiconductor device fabrication.
Original Abstract Submitted
the present disclosure relates to a semiconductor device manufacturing system. the semiconductor device manufacturing system can include a chamber and an ion source in the chamber. the ion source can include an outlet. the ion source can be configured to generate a particle beam. the semiconductor device manufacturing system can further include a grid structure proximate to the outlet of the ion source and configured to manipulate the particle beam. a first portion of the grid structure can be electrically insulated from a second portion of the grid structure.
