Taiwan semiconductor manufacturing company, ltd. (20240379330). GAS DISTRIBUTION RING FOR PROCESS CHAMBER simplified abstract
Contents
GAS DISTRIBUTION RING FOR PROCESS CHAMBER
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Po-Hsiang Wang of New Taipei City (TW)
Min-Chang Ching of Zhubei City (TW)
Kuo Liang Lu of Hsinchu City (TW)
Bo-Han Chu of Taipei City (TW)
GAS DISTRIBUTION RING FOR PROCESS CHAMBER - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240379330 titled 'GAS DISTRIBUTION RING FOR PROCESS CHAMBER
The present disclosure pertains to an integrated chip processing tool with a gas distribution ring that extends along the perimeter of a process chamber. The gas distribution ring includes a lower ring with gas inlets on the bottom surface and gas conveyance channels on the upper surface, covered by an upper ring. Gas outlets are located at the ends of the gas conveyance channels, which have equal lengths.
- Gas distribution ring extends along the perimeter of a process chamber
- Lower ring with gas inlets on the bottom surface and gas conveyance channels on the upper surface
- Upper ring covers the gas conveyance channels
- Gas outlets at the ends of the gas conveyance channels
- Gas conveyance paths between gas inlets and outlets have equal lengths
Potential Applications: - Semiconductor manufacturing - Microelectronics fabrication - Thin film deposition processes
Problems Solved: - Efficient gas distribution in a process chamber - Uniform processing of integrated chips - Enhanced control over gas flow
Benefits: - Improved chip processing quality - Increased productivity - Consistent results
Commercial Applications: Title: Gas Distribution Ring for Integrated Chip Processing Tools This technology can be utilized in semiconductor manufacturing facilities, microelectronics companies, and research institutions. It can lead to more precise and reliable chip processing, ultimately improving the quality of integrated circuits.
Questions about Gas Distribution Ring for Integrated Chip Processing Tools: 1. How does the gas distribution ring improve chip processing efficiency? The gas distribution ring ensures uniform gas flow in the process chamber, leading to consistent processing results and improved chip quality.
2. What are the key advantages of using a gas distribution ring in integrated chip processing tools? The gas distribution ring enables better control over gas distribution, resulting in enhanced productivity and more reliable chip manufacturing processes.
Original Abstract Submitted
the present disclosure relates to an integrated chip processing tool. the integrated chip processing tool includes a gas distribution ring configured to extend along a perimeter of a process chamber. the gas distribution ring includes a lower ring extending around the process chamber. the lower ring has a plurality of gas inlets arranged along a bottom surface of the lower ring and a plurality of gas conveyance channels arranged along an upper surface of the lower ring directly over the plurality of gas inlets. the gas distribution ring further includes an upper ring disposed on the upper surface of the lower ring and covering the plurality of gas conveyance channels. a plurality of gas outlets are arranged along opposing ends of the plurality of gas conveyance channels. a plurality of gas conveyance paths extending between the plurality of gas inlets and the plurality of gas outlets have approximately equal lengths.
