Taiwan semiconductor manufacturing company, ltd. (20240379259). EUV LITHOGRAPHY APPARATUS simplified abstract
Contents
EUV LITHOGRAPHY APPARATUS
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Cheng Hung Tsai of Hsinchu (TW)
Sheng-Kang Yu of Hsinchu City (TW)
Shang-Chieh Chien of New Taipei City (TW)
Heng-Hsin Liu of New Taipei City (TW)
Li-Jui Chen of Hsinchu City (TW)
EUV LITHOGRAPHY APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240379259 titled 'EUV LITHOGRAPHY APPARATUS
The abstract of the patent application describes an extreme ultra violet (EUV) light source apparatus that includes an excitation laser inlet port and a first mirror to reflect the excitation laser passing through a zone of excitation, which then irradiates a metal droplet.
- Excitation laser inlet port to receive excitation laser
- First mirror to reflect excitation laser passing through zone of excitation
- Metal droplet irradiated by excitation laser
Potential Applications: - Semiconductor manufacturing - Lithography processes - Microelectronics fabrication
Problems Solved: - Providing a reliable EUV light source for industrial applications - Enhancing precision in manufacturing processes
Benefits: - Improved accuracy and efficiency in semiconductor production - Enhanced resolution in lithography processes
Commercial Applications: Title: "Advanced EUV Light Source for Semiconductor Manufacturing" This technology can be used in semiconductor fabrication facilities to enhance the quality and precision of manufacturing processes, leading to higher yields and improved product performance.
Questions about EUV Light Source Technology: 1. How does the excitation laser contribute to the efficiency of the EUV light source? 2. What are the key advantages of using EUV light sources in semiconductor manufacturing?
Original Abstract Submitted
an extreme ultra violet (euv) light source apparatus includes an excitation laser inlet port configured to receive an excitation laser, and a first mirror configured to reflect the excitation laser that passes through a zone of excitation. a metal droplet is irradiated by the excitation laser.
