Taiwan semiconductor manufacturing company, ltd. (20240378715). SYSTEM AND METHOD FOR SEMICONDUCTOR TOPOGRAPHY SIMULATIONS simplified abstract
Contents
SYSTEM AND METHOD FOR SEMICONDUCTOR TOPOGRAPHY SIMULATIONS
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Zhengping Jiang of Hsinchu (TW)
Yuan Hao Chang of Hsinchu (TW)
Zhiqiang Wu of Hsinchu County (TW)
Wen-Hsing Hsieh of Hsinchu City (TW)
SYSTEM AND METHOD FOR SEMICONDUCTOR TOPOGRAPHY SIMULATIONS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240378715 titled 'SYSTEM AND METHOD FOR SEMICONDUCTOR TOPOGRAPHY SIMULATIONS
The present disclosure describes a method for simulating the topography of a physical structure undergoing a topography-changing process.
- Initializing a voxel mesh as a 3D representation of the physical structure by a CPU.
- Generating a batch of particles.
- Simulating the flight path of a particle using ray-tracing in a GPU.
- Identifying the surface normal of a voxel unit intersecting the flight path.
- Passing parameters from the GPU to the CPU to describe the particle hitting the voxel mesh.
- Determining the surface reaction between the particle and the voxel unit.
- Updating the voxel mesh based on the surface reaction.
Potential Applications: - Manufacturing processes - Material science research - Semiconductor industry
Problems Solved: - Accurately simulating topography changes in physical structures - Enhancing understanding of surface reactions
Benefits: - Improved efficiency in process optimization - Enhanced visualization of topography changes - Facilitates research and development in various industries
Commercial Applications: Title: Advanced Topography Simulation Technology for Manufacturing Processes This technology can be used in industries such as semiconductor manufacturing, material science research, and 3D printing for precise topography simulations and process optimization.
Questions about Topography Simulation Technology: 1. How does this technology improve the accuracy of simulating topography changes in physical structures? - This technology utilizes a combination of CPU and GPU processing to accurately simulate particle interactions with a voxel mesh, leading to more precise topography simulations.
2. What are the potential applications of this technology beyond manufacturing processes? - This technology can also be applied in fields such as geology, architecture, and medical imaging for simulating and analyzing complex surface structures.
Original Abstract Submitted
the present disclosure provides a method for topography simulation of a physical structure under a topography-changing process. the method includes initializing a voxel mesh as a three-dimensional (3d) representation of a physical structure by a central processing unit (cpu), generating a batch of particles, simulating a flight path of one of the particles with a ray-tracing method by a parallel processing thread in a graphics processing unit (gpu), identifying a surface normal of a voxel unit in the voxel mesh that intersects the flight path by the parallel processing thread in the gpu, passing parameters describing the one of the particles hitting the voxel mesh from the gpu to the cpu, determining a surface reaction between the one of the particles and the voxel unit by the cpu, and updating the voxel mesh based on the determining of the surface reaction.
