Taiwan semiconductor manufacturing company, ltd. (20240378362). HOTSPOT AVOIDANCE METHOD OF MANUFACTURING INTEGRATED CIRCUITS simplified abstract

From WikiPatents
Revision as of 06:49, 21 November 2024 by Wikipatents (talk | contribs) (Creating a new page)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search

HOTSPOT AVOIDANCE METHOD OF MANUFACTURING INTEGRATED CIRCUITS

Organization Name

taiwan semiconductor manufacturing company, ltd.

Inventor(s)

I-Shuo Liu of Hsinchu (TW)

Chih-Chun Hsia of Hsinchu (TW)

Hsin-Ting Chou of Hsinchu (TW)

Kuanhua Su of Hsinchu (TW)

William Weilun Hong of Hsinchu (TW)

Chih Hung Chen of Hsinchu (TW)

Kei-Wei Chen of Tainan City (TW)

HOTSPOT AVOIDANCE METHOD OF MANUFACTURING INTEGRATED CIRCUITS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240378362 titled 'HOTSPOT AVOIDANCE METHOD OF MANUFACTURING INTEGRATED CIRCUITS

Simplified Explanation: The method involves cropping images from an integrated circuit layout, generating hash values for each image, comparing them with stored hash values, and recording positions of matching images.

Key Features and Innovation:

  • Cropping images from an integrated circuit layout
  • Generating hash values for each image
  • Comparing hash values with stored values
  • Recording positions of matching images

Potential Applications: This technology can be used in the semiconductor industry for quality control and identification of defects in integrated circuits.

Problems Solved: This technology helps in efficiently identifying and locating specific images within an integrated circuit layout.

Benefits:

  • Improved quality control in the semiconductor industry
  • Faster identification of defects in integrated circuits
  • Enhanced efficiency in image comparison processes

Commercial Applications: This technology can be utilized by semiconductor manufacturers for quality assurance and defect detection in integrated circuits, leading to improved product reliability and performance.

Prior Art: Researchers can explore prior art related to image comparison methods in the semiconductor industry to understand the evolution of similar technologies.

Frequently Updated Research: Stay updated on advancements in image comparison techniques and applications in the semiconductor industry to enhance the efficiency and accuracy of integrated circuit analysis.

Questions about Image Comparison in Integrated Circuits: 1. How does this technology improve the quality control process in the semiconductor industry? 2. What are the potential commercial implications of using this method for image comparison in integrated circuits?


Original Abstract Submitted

a method includes cropping a plurality of images from a layout of an integrated circuit, generating a first plurality of hash values, each from one of the plurality of images, loading a second plurality of hash values stored in a hotspot library, and comparing each of the first plurality of hash values with each of the second plurality of hash values. the step of comparing includes calculating a similarity value between the each of the first plurality of hash values and the each of the second plurality of hash values. the method further includes comparing the similarity value with a pre-determined threshold similarity value, and in response to a result that the similarity value is greater than the pre-determined threshold similarity value, recording a position of a corresponding image that has the result. the position is the position of the corresponding image in the layout.