Taiwan semiconductor manufacturing company, ltd. (20240378361). SEMICONDUCTOR DEVICE LAYOUT simplified abstract

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SEMICONDUCTOR DEVICE LAYOUT

Organization Name

taiwan semiconductor manufacturing company, ltd.

Inventor(s)

Shih-Wei Peng of Hsinchu (TW)

Te-Hsin Chiu of Hsinchu (TW)

Jiann-Tyng Tzeng of Hsinchu (TW)

SEMICONDUCTOR DEVICE LAYOUT - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240378361 titled 'SEMICONDUCTOR DEVICE LAYOUT

    • Simplified Explanation:**

In some embodiments, portions of a pattern in an integrated circuit layer, such as metallic power lines in a power grid, are removed after the layout process through a computer-implemented process similar to solving the n-coloring problem.

    • Key Features and Innovation:**

- Post-processing removal of pattern portions to reduce layer coverage in the integrated circuit. - Avoid harmful effects like severing power lines. - Analogous to solving the n-coloring problem. - Allows for precise control over the extent of pattern removal.

    • Potential Applications:**

- Semiconductor manufacturing - Integrated circuit design - Power grid optimization

    • Problems Solved:**

- Overlapping patterns in integrated circuits - Ensuring proper functionality of power lines - Minimizing fabrication errors

    • Benefits:**

- Enhanced control over layer coverage - Improved efficiency in integrated circuit fabrication - Reduction of harmful effects in power grid design

    • Commercial Applications:**

"Computer-Implemented Process for Post-Processing Removal of Pattern Portions in Integrated Circuits"

    • Questions about Computer-Implemented Process for Post-Processing Removal of Pattern Portions in Integrated Circuits:**

1. How does the post-processing removal process improve the efficiency of integrated circuit fabrication? 2. What are the potential challenges in implementing this computer-implemented process in semiconductor manufacturing?


Original Abstract Submitted

in some embodiments, portions of a pattern, generated in a layout process, of a layer in an integrated circuit, such as those of a layer of metallic power lines in a power grid (pg), are removed after the layout process through a computer-implemented process analogous to solving the n-coloring problem. through this post-processing removal process, pattern portions can be removed so as reduce the coverage of the layer in the fabricated integrated circuit to a desired extent without producing certain harmful effects, such as severing a powerline.