Taiwan semiconductor manufacturing company, ltd. (20240377766). SYSTEM AND METHOD FOR CLEANING AN EUV MASK simplified abstract

SYSTEM AND METHOD FOR CLEANING AN EUV MASK

Organization Name

taiwan semiconductor manufacturing company, ltd.

Inventor(s)

Yen-Hui Li of Hsinchu (TW)

Cheng-Han Yeh of Hsinchu (TW)

Tzung-Chi Fu of Hsinchu (TW)

SYSTEM AND METHOD FOR CLEANING AN EUV MASK - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240377766 titled 'SYSTEM AND METHOD FOR CLEANING AN EUV MASK

The abstract describes an extreme ultraviolet (EUV) photolithography system designed to clean debris from an EUV reticle. The system includes a cleaning electrode positioned next to the reticle and a voltage source that helps draw debris towards the electrode by applying alternating polarity voltages.

• The system is specifically designed for cleaning debris from an EUV reticle in a photolithography system.
• It includes a cleaning electrode positioned adjacent to the reticle to attract and remove debris.
• A voltage source is used to apply alternating polarity voltages to the cleaning electrode, aiding in the removal of debris.
• The technology aims to improve the cleanliness and efficiency of EUV photolithography processes.
• By effectively removing debris from the reticle, the system helps maintain the quality and accuracy of the lithography process.

Potential Applications: - Semiconductor manufacturing - Advanced imaging technology - Microelectronics production

Problems Solved: - Debris contamination on EUV reticles - Maintaining the accuracy and quality of lithography processes

Benefits: - Improved cleanliness and efficiency in EUV photolithography - Enhanced quality and accuracy of semiconductor manufacturing - Reduced risk of defects in microelectronics production

Commercial Applications: Title: Advanced EUV Photolithography Cleaning System This technology can be utilized in semiconductor fabrication facilities to enhance the quality and efficiency of lithography processes. It can also be integrated into advanced imaging systems for improved performance.

Questions about EUV Photolithography Cleaning System: 1. How does the alternating polarity voltage help in drawing debris towards the cleaning electrode?

  - The alternating polarity voltage creates an electric field that attracts debris towards the cleaning electrode, facilitating its removal.

2. What are the potential long-term benefits of using this cleaning system in semiconductor manufacturing?

  - The long-term benefits include improved product quality, reduced defects, and increased efficiency in the manufacturing process.

Original Abstract Submitted

an extreme ultraviolet (euv) photolithography system cleans debris from an euv reticle. the system includes a cleaning electrode configured to be positioned adjacent the euv reticle. the system includes a voltage source that helps draw debris from the euv reticle toward the cleaning electrode by applying a voltage of alternating polarity to the cleaning electrode.