Taiwan semiconductor manufacturing company, ltd. (20240377764). SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM simplified abstract
Contents
SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Shang-Chieh Chien of Hsinchu (TW)
SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240377764 titled 'SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
Simplified Explanation: An extreme ultraviolet (EUV) photolithography system is designed to detect debris traveling from an EUV generation chamber to a scanner. The system includes a detection light source and a sensor to identify debris particles.
- The EUV photolithography system utilizes a detection light source to emit light across the path of debris particles from the EUV generation chamber.
- A sensor is employed to detect the interaction of debris particles with the detection light, allowing for the identification of debris traveling towards the scanner.
Key Features and Innovation:
- Detection light source emits light to detect debris particles.
- Sensor identifies debris particles by their interaction with the detection light.
- System helps prevent debris contamination in the scanner.
Potential Applications: The technology can be applied in semiconductor manufacturing processes where cleanliness is crucial to ensure high-quality production.
Problems Solved: The system addresses the issue of debris contamination in the scanner, which can negatively impact the quality of semiconductor products.
Benefits:
- Improved cleanliness and quality control in semiconductor manufacturing.
- Enhanced efficiency and reliability of the photolithography process.
Commercial Applications: The EUV photolithography system can be utilized in semiconductor fabrication facilities to enhance production quality and efficiency.
Questions about EUV Photolithography System: 1. How does the detection light source help in identifying debris particles? 2. What are the potential implications of debris contamination in the scanner?
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Original Abstract Submitted
an extreme ultraviolet (euv) photolithography system detects debris travelling from an euv generation chamber to a scanner. the photolithography system includes a detection light source and a sensor. the detection light source outputs a detection light across a path of travel of debris particles from the euv generation chamber. the sensor senses debris particles by detecting interaction of the debris particles with the detection light.
