Taiwan semiconductor manufacturing company, ltd. (20240377752). SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES simplified abstract
Contents
SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Shang-Chieh Chien of Hsinchu (TW)
SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240377752 titled 'SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES
Simplified Explanation:
This patent application describes a photolithography system that uses tin droplets to produce extreme ultraviolet radiation for photolithography. The system irradiates the droplets with a laser, turning them into plasma that emits extreme ultraviolet radiation. Sensors detect the radiation and charged particles emitted by the droplets, and a control system adjusts plasma generation parameters based on the sensor signals.
- The system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography.
- A laser is used to irradiate the tin droplets, turning them into plasma that emits extreme ultraviolet radiation.
- Sensors in the system detect the extreme ultraviolet radiation and charged particles emitted by the droplets.
- A control system analyzes sensor signals and adjusts plasma generation parameters accordingly.
Potential Applications: - Semiconductor manufacturing - Microelectronics industry - Advanced lithography processes
Problems Solved: - Enhancing resolution and precision in photolithography - Improving efficiency in semiconductor manufacturing - Advancing technology in the microelectronics industry
Benefits: - Higher quality and more precise lithography - Increased efficiency in semiconductor manufacturing - Advancements in microelectronics technology
Commercial Applications: Title: Advanced Photolithography System for Semiconductor Manufacturing This technology could be used in semiconductor fabrication facilities to improve lithography processes, leading to higher quality and more efficient production of microelectronic devices. The market implications include increased competitiveness for companies utilizing this advanced photolithography system.
Questions about Photolithography System with Tin Droplets: 1. How does the use of tin droplets improve the efficiency of extreme ultraviolet radiation generation for photolithography? 2. What are the specific parameters that the control system adjusts based on the sensor signals in the photolithography system with tin droplets?
Frequently Updated Research: Ongoing research in the field of photolithography systems with tin droplets focuses on optimizing plasma generation parameters for even higher efficiency and precision in extreme ultraviolet radiation generation. Researchers are also exploring potential applications of this technology in other industries beyond semiconductor manufacturing.
Original Abstract Submitted
a photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. the photolithography system irradiates the droplets with a laser. the droplets become a plasma and emit extreme ultraviolet radiation. an array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. a control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.
