Taiwan semiconductor manufacturing company, ltd. (20240377750). METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE simplified abstract
Contents
- 1 METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Semiconductor Manufacturing Technology
- 1.13 Original Abstract Submitted
METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Jing Chang of Taoyuan City (TW)
Ching-Hai Yang of Taipei City (TW)
Wei-Hsiang Tseng of Hsinchu (TW)
METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240377750 titled 'METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE
Simplified Explanation
The patent application describes an apparatus for manufacturing semiconductor devices that uses cameras and image recognition to ensure precise dispensing of photoresist composition on a substrate.
- The apparatus includes a fluid dispense nozzle for dispensing the photoresist composition.
- Two cameras are used to capture images of the nozzle, with the second camera providing higher resolution.
- An image recognition system analyzes the images to determine the width of the nozzle and the spray pattern of the photoresist composition.
Key Features and Innovation
- Utilization of two cameras with different resolutions for capturing images of the fluid dispense nozzle.
- Image recognition system to analyze images and determine the width of the nozzle and spray pattern of the photoresist composition.
- Ensures precise dispensing of photoresist composition on semiconductor substrates.
Potential Applications
- Semiconductor manufacturing industry.
- Quality control in the production of semiconductor devices.
- Research and development of new semiconductor technologies.
Problems Solved
- Ensures accurate dispensing of photoresist composition on semiconductor substrates.
- Improves quality control processes in semiconductor manufacturing.
- Enhances overall efficiency and precision in the production of semiconductor devices.
Benefits
- Increased accuracy in dispensing photoresist composition.
- Improved quality control measures.
- Enhanced efficiency and precision in semiconductor manufacturing processes.
Commercial Applications
Precision Semiconductor Manufacturing Apparatus
This technology can be utilized in semiconductor manufacturing facilities to improve the accuracy and efficiency of photoresist composition dispensing processes, leading to higher quality semiconductor devices.
Prior Art
There may be prior art related to image recognition systems used in semiconductor manufacturing processes. Researchers can explore patents and publications in the field of semiconductor manufacturing automation and quality control.
Frequently Updated Research
Researchers in the field of semiconductor manufacturing are constantly developing new technologies and methods to enhance the efficiency and precision of production processes. Stay updated on the latest advancements in image recognition systems and quality control measures in semiconductor manufacturing.
Questions about Semiconductor Manufacturing Technology
How does the use of image recognition systems improve the quality control in semiconductor manufacturing processes?
The use of image recognition systems allows for precise analysis of dispensing processes, ensuring accurate application of photoresist composition on semiconductor substrates.
What are the potential implications of implementing this technology in semiconductor manufacturing facilities?
Implementing this technology can lead to improved efficiency, accuracy, and quality control in semiconductor manufacturing, ultimately enhancing the overall production processes and the quality of semiconductor devices.
Original Abstract Submitted
an apparatus for manufacturing a semiconductor device includes a fluid dispense nozzle configured to dispense a photoresist composition on a semiconductor substrate, and a first camera configured to obtain a first image of the fluid dispense nozzle. the apparatus further includes a second camera configured to obtain a second image of the fluid dispense nozzle, the second image having a higher resolution than the first image, and an image recognition system operably coupled to the first and second cameras. the image recognition system includes a memory storing instructions and at least one processor that executes the instructions to obtain an image of a benchmark fluid dispense nozzle using the second camera, and determine a width of the benchmark fluid dispense nozzle at multiple intervals along the benchmark fluid dispense nozzle and a width of a spray pattern of the photoresist composition being dispensed from the benchmark fluid dispense nozzle.
