Taiwan semiconductor manufacturing company, ltd. (20240377739). RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
Contents
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Siao-Shan Wang of Tainan City (TW)
Ching-Yu Chang of Yuansun Village (TW)
Chin-Hsiang Lin of Hsinchu (TW)
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240377739 titled 'RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
The abstract of the patent application describes a method for manufacturing a semiconductor device using a photoresist layer with a specific composition.
- The method involves forming a photoresist layer on a substrate and exposing it to actinic radiation to create a latent pattern.
- The latent pattern is then developed by applying a developer to the exposed photoresist layer, resulting in a patterned photoresist.
- The photoresist composition includes a photoactive compound, a resin with a radical-active functional group, and an acid labile group.
Potential Applications: - Semiconductor manufacturing - Microelectronics industry - Photolithography processes
Problems Solved: - Achieving precise patterning in semiconductor devices - Enhancing the efficiency of manufacturing processes - Improving the quality and reliability of semiconductor components
Benefits: - Increased accuracy in patterning - Cost-effective manufacturing - Enhanced performance of semiconductor devices
Commercial Applications: Title: Advanced Semiconductor Manufacturing Process This technology can be utilized in the production of various semiconductor devices, such as microprocessors, memory chips, and sensors. It can benefit companies in the semiconductor industry by improving production efficiency and product quality.
Prior Art: Readers can explore prior art related to photoresist compositions, semiconductor manufacturing methods, and photolithography processes to gain a deeper understanding of the technology.
Frequently Updated Research: Researchers are constantly exploring new photoresist compositions and manufacturing techniques to further enhance semiconductor device production.
Questions about the technology: 1. How does the specific composition of the photoresist layer contribute to the manufacturing process? 2. What are the potential advancements in semiconductor manufacturing that can be achieved using this method?
Original Abstract Submitted
a method for manufacturing a semiconductor device includes forming a photoresist layer including a photoresist composition over a substrate. the photoresist layer is selectively exposed to actinic radiation to form a latent pattern and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist. the photoresist composition includes a photoactive compound and a resin comprising a radical-active functional group and an acid labile group.
