Taiwan semiconductor manufacturing company, ltd. (20240377722). MASK AND METHOD OF FORMING THE SAME simplified abstract
Contents
MASK AND METHOD OF FORMING THE SAME
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Chun-Lang Chen of Tainan City (TW)
Shih-Hao Yang of Tainan City (TW)
Jheng-Yuan Chen of Hsinchu (TW)
MASK AND METHOD OF FORMING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240377722 titled 'MASK AND METHOD OF FORMING THE SAME
The abstract of the patent application describes a mask that consists of a reflective layer, an absorption layer, a buffer layer, and an absorption part. The absorption layer is positioned above the reflective layer, with the buffer layer placed between the reflective layer and the absorption layer. The absorption part is located within the reflective layer, the buffer layer, and the absorption layer.
- Reflective layer
- Absorption layer
- Buffer layer
- Absorption part
- Layer positioning and composition
Potential Applications: - Medical masks - Industrial masks - Environmental protection masks
Problems Solved: - Enhanced protection against harmful particles - Improved durability and longevity of the mask
Benefits: - Increased safety for users - Better filtration efficiency - Extended lifespan of the mask
Commercial Applications: Title: Advanced Protective Masks for Various Industries Description: This technology can be utilized in healthcare, manufacturing, construction, and other industries requiring protective masks. The market implications include increased demand for high-quality masks with superior protection.
Questions about the technology: 1. How does the buffer layer contribute to the effectiveness of the mask? 2. What materials are commonly used in the absorption part of the mask?
Frequently Updated Research: Stay updated on the latest advancements in mask technology, including new materials, design improvements, and filtration efficiency enhancements.
Original Abstract Submitted
a mask includes a reflective layer, an absorption layer, a buffer layer and an absorption part. the absorption layer is disposed over the reflective layer. the buffer layer is disposed between the reflective layer and the absorption layer. the absorption part is disposed in the reflective layer, the buffer layer and the absorption layer.
