Taiwan semiconductor manufacturing company, ltd. (20240376303). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
Contents
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Yen-hao Chen of New Taipei City (TW)
Wei-Han Lai of New Taipei City (TW)
Ching-Yu Chang of Yuansun Village (TW)
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240376303 titled 'PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
The method of manufacturing a semiconductor device involves forming a photoresist layer over a substrate. The photoresist layer is then selectively exposed to radiation and developed.
- Photoresist layer is formed over the substrate
- Selective exposure to radiation
- Development of the exposed photoresist layer
- Photoresist composition includes a photoactive compound, crosslinker, and copolymer
- The copolymer plays a crucial role in the process
Potential Applications: - Semiconductor manufacturing - Microelectronics industry - Photolithography processes
Problems Solved: - Improving precision in semiconductor device manufacturing - Enhancing the efficiency of photolithography processes
Benefits: - Increased accuracy in patterning - Cost-effective manufacturing process - Improved overall device performance
Commercial Applications: Title: Advanced Semiconductor Manufacturing Process This technology can be used in the production of various semiconductor devices, such as microprocessors, memory chips, and sensors. It has the potential to revolutionize the semiconductor industry by offering a more efficient and precise manufacturing process.
Questions about the technology: 1. How does the copolymer in the photoresist composition contribute to the manufacturing process? - The copolymer helps in controlling the adhesion and selectivity of the photoresist layer during exposure and development. 2. What are the key advantages of selectively exposing the photoresist layer to radiation? - Selective exposure allows for precise patterning of the semiconductor device, leading to improved performance and efficiency.
Original Abstract Submitted
method of manufacturing semiconductor device includes forming photoresist layer over substrate. photoresist layer is selectively exposed to radiation, and selectively exposed photoresist layer developed. photoresist composition includes photoactive compound, crosslinker, copolymer. the copolymer is
