Georgia Tech Research Corporation (20240351272). PROJECTION TWO-PHOTON LITHOGRAPHY METHOD AND SYSTEM FOR RAPID PRINTING OF 3D STRUCTURES WITH SUB-MICROMETER FEATURES AND POROSITIES simplified abstract

PROJECTION TWO-PHOTON LITHOGRAPHY METHOD AND SYSTEM FOR RAPID PRINTING OF 3D STRUCTURES WITH SUB-MICROMETER FEATURES AND POROSITIES

Organization Name

Georgia Tech Research Corporation

Inventor(s)

Sourabh Kumar Saha of Atlanta GA (US)

Harnjoo Kim of Atlanta GA (US)

Rushil Pingali of Atlanta GA (US)

PROJECTION TWO-PHOTON LITHOGRAPHY METHOD AND SYSTEM FOR RAPID PRINTING OF 3D STRUCTURES WITH SUB-MICROMETER FEATURES AND POROSITIES - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240351272 titled 'PROJECTION TWO-PHOTON LITHOGRAPHY METHOD AND SYSTEM FOR RAPID PRINTING OF 3D STRUCTURES WITH SUB-MICROMETER FEATURES AND POROSITIES

The patent application describes systems, methods, devices, and compositions of matter for 3D printing methods and systems that enable rapid nanoscale 3D printing of large and deterministic structures with sub-micrometer features and porosities.

• Storing or determining a plurality of interspersed features for a 3D structure to project as a sequence of sparse images on the same plane to generate closely spaced fine features on a polymer resist.
• Generating a plurality of patterned light sheets on the polymer resist with a temporally-focused femtosecond pulse using the sequence of sparse images.

1. 1. 1. Potential Applications:

This technology could be applied in the fields of microelectronics, biomedical engineering, and nanotechnology for creating intricate and precise structures with sub-micrometer features.

1. 1. 1. Problems Solved:

This innovation addresses the challenge of achieving rapid nanoscale 3D printing of large structures with high precision and porosities, which is crucial for various advanced applications.

1. 1. 1. Benefits:

The technology enables the production of complex 3D structures with sub-micrometer features at a rapid pace, opening up new possibilities in research and industrial applications.

1. 1. 1. Commercial Applications:

"Advanced Nanoscale 3D Printing Technology for Precision Manufacturing" - This technology could revolutionize the manufacturing industry by offering a high-precision, rapid prototyping solution for intricate structures.

1. 1. 1. Prior Art:

Readers can explore prior research on femtosecond laser technology, nanoscale 3D printing, and polymer resist materials to gain a deeper understanding of the background of this innovation.

1. 1. 1. Frequently Updated Research:

Stay updated on the latest advancements in femtosecond laser technology, nanoscale 3D printing techniques, and polymer materials research to enhance the application of this technology.

1. 1. 1. 1. Questions about Nanoscale 3D Printing:

1. How does femtosecond laser technology contribute to the precision of nanoscale 3D printing? 2. What are the key challenges in scaling up nanoscale 3D printing for industrial applications?

Original Abstract Submitted

systems, methods, devices, and compositions of matter for 3d printing methods and systems that can be used for rapid nanoscale 3d printing of large and deterministic 3d structures with sub-micrometer features and porosities. the method includes storing or determining a plurality of interspersed features for a three-dimensional (3d) structure to project as a sequence of sparse images on the same plane to generate closely spaced fine features on a polymer resist; and generating, using the sequence of sparse images, a plurality of patterned light sheet on the polymer resist with a temporally-focused femtosecond pulse, the light sheet having patterns.