Samsung electronics co., ltd. (20240357849). FILM PATTERNING METHOD AND ELECTROLUMINESCENT DEVICE AND DISPLAY DEVICE INCLUDING A PATTERNED FILM simplified abstract
Contents
FILM PATTERNING METHOD AND ELECTROLUMINESCENT DEVICE AND DISPLAY DEVICE INCLUDING A PATTERNED FILM
Organization Name
Inventor(s)
Seongkyu Maeng of Daejeon (KR)
FILM PATTERNING METHOD AND ELECTROLUMINESCENT DEVICE AND DISPLAY DEVICE INCLUDING A PATTERNED FILM - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240357849 titled 'FILM PATTERNING METHOD AND ELECTROLUMINESCENT DEVICE AND DISPLAY DEVICE INCLUDING A PATTERNED FILM
The method described in the abstract involves manufacturing a patterned film for use in a light emitting device. Here is a simplified explanation of the abstract:
- A first film is created with semiconductor nanoparticles and an additive containing a polythiol compound.
- The film is exposed to radiation to change the solubility of the nanoparticles in a solvent.
- The film is then treated with the solvent to remove unexposed areas, resulting in a patterned film.
Key Features and Innovation:
- Use of semiconductor nanoparticles and polythiol compound additive in film manufacturing.
- Radiation exposure to create patterned film with varying solubility.
- Application in light emitting devices as a light emitting layer.
Potential Applications:
- Light emitting devices
- Display technologies
- Photovoltaic devices
Problems Solved:
- Efficient manufacturing of patterned films
- Improved control over film properties
- Enhanced performance in light emitting devices
Benefits:
- Enhanced device performance
- Cost-effective manufacturing process
- Versatile applications in various technologies
Commercial Applications:
- "Manufacturing Method for Patterned Film in Light Emitting Devices: Market Implications and Commercial Uses"
Prior Art:
- Researchers can explore prior patents related to semiconductor nanoparticle films and patterned film manufacturing processes.
Frequently Updated Research:
- Stay updated on advancements in semiconductor nanoparticle technology and film patterning techniques.
Questions about the Technology: 1. How does the use of polythiol compounds impact the properties of the film? 2. What are the potential challenges in scaling up this manufacturing method for commercial production?
Original Abstract Submitted
a method of manufacturing a patterned film includes forming a first film including a semiconductor nanoparticle and an additive, wherein the additive includes a polythiol compound, the semiconductor nanoparticle includes an organic ligand (for example, on a surface thereof), and the organic ligand includes a first functional group bonded to the surface of the semiconductor nanoparticle and a carbon-carbon unsaturated bond; exposing a portion of the first film to a radiation to cause a change in a solubility of the semiconductor nanoparticle in the exposed area with respect to a first solvent; contacting the radiation treated film with the first solvent to remove at least a portion of an unexposed area of the radiation treated film to obtain a patterned film. a light emitting device includes such a patterned film as a light emitting layer.
