Samsung electronics co., ltd. (20240353764). LITHOGRAPHY APPARATUS simplified abstract
Contents
LITHOGRAPHY APPARATUS
Organization Name
Inventor(s)
Kyung Chin Yi of Suwon-si (KR)
Dong Sik Jeong of Suwon-si (KR)
Woo-Hyung Kim of Suwon-si (KR)
Seung Uk Park of Suwon-si (KR)
LITHOGRAPHY APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240353764 titled 'LITHOGRAPHY APPARATUS
The patent application describes a lithography apparatus with a unique cable configuration to prevent sagging and bending during wafer stage movement.
- The cable connected to the wafer stage is designed to bend based on the stage's motion.
- A support unit with clamps restricts cable movement to prevent sagging.
- A protective unit made of ultra-high molecular weight polyethylene (UHMWPE) collides with the support unit to protect the cable during movement.
Potential Applications: - Semiconductor manufacturing - Nanotechnology research - Precision engineering industries
Problems Solved: - Prevents cable sagging and bending during lithography processes - Ensures precise movement of the wafer stage without interference
Benefits: - Improved accuracy in lithography processes - Enhanced durability of the cable system - Increased efficiency in semiconductor manufacturing
Commercial Applications: Title: Advanced Lithography Apparatus for Semiconductor Manufacturing This technology can be used in semiconductor fabrication facilities to enhance the precision and efficiency of lithography processes, leading to higher quality semiconductor products and increased productivity in the industry.
Questions about Lithography Apparatus with Cable Configuration: 1. How does the protective unit made of UHMWPE contribute to the overall functionality of the apparatus? - The UHMWPE protective unit acts as a collision barrier to safeguard the cable during wafer stage movement, preventing damage and ensuring smooth operation.
2. What are the key advantages of using a support unit with clamps in the cable configuration of the lithography apparatus? - The support unit with clamps effectively restricts cable movement, preventing sagging and maintaining the desired position during lithography processes.
Original Abstract Submitted
provided is a lithography apparatus including a wafer stage, a cable connected to the wafer stage, the cable being configured to bend based on the wafer stage moving, a support unit configured to prevent the cable from sagging, the support unit including a plurality of clamps configured to restrict movement of the cable and a connection member connecting the plurality of clamps to each other, and a protective unit under the cable, the protective unit being configured to collide with the support unit based on the wafer stage moving, wherein the protective unit includes ultra-high molecular weight polyethylene (uhmwpe).
