Samsung electronics co., ltd. (20240353350). WAFER ABNORMALITY DETECTION METHOD AND A SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract
Contents
- 1 WAFER ABNORMALITY DETECTION METHOD AND A SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 WAFER ABNORMALITY DETECTION METHOD AND A SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Questions about Wafer Abnormality Detection
- 1.11 Original Abstract Submitted
WAFER ABNORMALITY DETECTION METHOD AND A SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
Organization Name
Inventor(s)
Choonshik Leem of Suwon-si (KR)
WAFER ABNORMALITY DETECTION METHOD AND A SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240353350 titled 'WAFER ABNORMALITY DETECTION METHOD AND A SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
Simplified Explanation
The patent application describes a method for detecting abnormalities in wafers by comparing measured and predicted spectra and using machine learning to identify abnormal data.
- Calculating residual spectrum between measured and predicted spectra for a wafer.
- Performing machine learning to determine abnormality in measurement data corresponding to the residual data.
Key Features and Innovation
- Integration of machine learning for wafer abnormality detection.
- Utilization of residual spectrum analysis for comparison.
- Enhancing accuracy and efficiency in identifying abnormal data in wafers.
Potential Applications
This technology can be applied in:
- Semiconductor manufacturing.
- Quality control in wafer production.
- Detection of defects in electronic components.
Problems Solved
- Improves detection of abnormalities in wafers.
- Enhances quality control processes in semiconductor industry.
- Reduces the risk of faulty electronic components.
Benefits
- Increased accuracy in identifying abnormalities.
- Streamlined quality control procedures.
- Improved reliability of electronic devices.
Commercial Applications
Title: Advanced Wafer Abnormality Detection Technology This technology can be utilized in:
- Semiconductor fabrication facilities.
- Electronic component manufacturing companies.
- Quality control equipment suppliers.
Questions about Wafer Abnormality Detection
1. How does this technology improve the efficiency of wafer quality control processes?
This technology enhances efficiency by utilizing machine learning to quickly identify abnormal data in wafers, reducing the time and resources required for manual inspection.
2. What are the potential cost-saving benefits for semiconductor manufacturers using this technology?
Semiconductor manufacturers can save costs by reducing the number of defective wafers and improving overall production efficiency, leading to higher quality products and reduced waste.
Original Abstract Submitted
a wafer abnormality detection method including: calculating a residual spectrum between a measured spectrum for a wafer and a predicted spectrum for the wafer; and performing machine learning to determine whether measurement data, which corresponds to the residual data, is abnormal.
- Samsung electronics co., ltd.
- Kihong Chung of Suwon-si (KR)
- Gucheol Kwon of Suwon-si (KR)
- Jaejoon Kim of Suwon-si (KR)
- Haemin Jeong of Suwon-si (KR)
- Minjae Huh of Suwon-si (KR)
- Hidong Kwak of Suwon-si (KR)
- Taejung Park of Suwon-si (KR)
- Jihye Lee of Suwon-si (KR)
- Choonshik Leem of Suwon-si (KR)
- G01N21/95
- G01N21/21
- G01N21/88
- H01L21/66
- CPC G01N21/9501