18372531. SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVERLAY METROLOGY simplified abstract (KLA Corporation)
Contents
SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVERLAY METROLOGY
Organization Name
Inventor(s)
Mordechy Kot of Migdal Haemek (IL)
Yuval Lubashevsky of Haifa (IL)
Nickolai Isakovitch of Tel-Aviv (IL)
SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVERLAY METROLOGY - A simplified explanation of the abstract
This abstract first appeared for US patent application 18372531 titled 'SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVERLAY METROLOGY
Simplified Explanation: The patent application describes a method involving receiving interference signals from photodetectors associated with grating structures, determining position and velocity of the grating structure, and calculating overlay errors during scanning.
- Grating structure with diffraction gratings
- Reference grating structure for comparison
- Real-time position and scanning velocity determination
- Overlay error calculation during scanning
Potential Applications: 1. Semiconductor manufacturing 2. Lithography processes 3. Optical metrology systems
Problems Solved: 1. Accurate position and velocity tracking 2. Overlay error reduction 3. Improved scanning efficiency
Benefits: 1. Enhanced precision in manufacturing processes 2. Increased yield in semiconductor production 3. Cost savings through error reduction
Commercial Applications: Optimizing Semiconductor Manufacturing Processes with Grating Structure Positioning and Error Calculation
Prior Art: Prior art related to this technology can be found in the field of optical metrology systems and semiconductor manufacturing processes.
Frequently Updated Research: Ongoing research in the field of optical metrology and semiconductor manufacturing may provide further insights into the application of grating structures for position tracking and error calculation.
Questions about Grating Structure Positioning and Error Calculation: 1. How does the method determine the real-time position of the grating structure during scanning? 2. What are the potential challenges in implementing this technology in semiconductor manufacturing processes?
Original Abstract Submitted
A method may include receiving time-varying interference signals from two or more photodetectors associated with a grating structure and a reference grating structure. The grating structure may include one or more diffraction gratings, where the reference grating structure includes a reference grating arranged next to the one or more diffraction gratings of the grating structure and where the one or more illumination beams simultaneously interact with grating structure and the reference grating structure as the sample is scanned relative to the illumination beam. The method may include determining at least one of a real-time position or a scanning velocity of the grating structure during the scan based on the reference grating signal. The method may include determining one or more overlay errors based on the grating signals from the grating structure and the real-time position of the grating structure during the scan determined based on the reference grating signal.
