18500499. SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

From WikiPatents
Revision as of 04:00, 18 October 2024 by Wikipatents (talk | contribs) (Creating a new page)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search

SEMICONDUCTOR DEVICE

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

DONGHOON Hwang of Suwon-si (KR)

HYOJIN Kim of Suwon-si (KR)

BYUNGHO Moon of Suwon-si (KR)

MYUNGIL Kang of Suwon-si (KR)

WOOSEOK Park of Suwon-si (KR)

JAEHO Jeon of Suwon-si (KR)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18500499 titled 'SEMICONDUCTOR DEVICE

The semiconductor device described in the abstract includes a substrate with an active pattern, first and second source/drain patterns overlapping with the active pattern, a separation insulating layer between the source/drain patterns, and first and second gate electrodes separated by the separation insulating layer.

  • The device features a separation insulating layer with a top surface higher than the top surfaces of the gate electrodes.
  • The first and second gate electrodes are spaced apart from each other.
  • The first and second source/drain patterns overlap with the active pattern on the substrate.
  • The separation insulating layer provides insulation between the gate electrodes and the source/drain patterns.
  • This configuration enhances the performance and efficiency of the semiconductor device.

Potential Applications: - This technology can be applied in the manufacturing of advanced semiconductor devices. - It can be used in the development of high-performance electronic devices.

Problems Solved: - Provides improved insulation between components in semiconductor devices. - Enhances the overall performance and efficiency of the device.

Benefits: - Increased performance and efficiency in semiconductor devices. - Enhanced reliability and durability of electronic components.

Commercial Applications: Title: Advanced Semiconductor Devices with Enhanced Insulation This technology can be utilized in the production of high-performance electronic devices for various industries, including telecommunications, computing, and consumer electronics. The improved insulation provided by the separation insulating layer can lead to more reliable and efficient devices, attracting manufacturers looking to enhance their product offerings.

Questions about the technology: 1. How does the separation insulating layer improve the performance of the semiconductor device? The separation insulating layer enhances the insulation between components, reducing interference and improving overall efficiency.

2. What are the potential market implications of this technology in the semiconductor industry? This technology could lead to the development of more advanced and reliable electronic devices, potentially increasing market competitiveness and driving innovation in the industry.


Original Abstract Submitted

A semiconductor device includes a substrate including an active pattern, first and second source/drain patterns overlapping with the active pattern, a separation insulating layer between the first and second source/drain patterns, and first and second gate electrodes spaced apart from each other with the separation insulating layer interposed therebetween. A level of a top surface of the separation insulating layer is higher than a level of a top surface of the first gate electrode and a level of a top surface of the second gate electrode.