18542172. CARRIER DECHUCKING SYSTEM AND CARRIER DECHUCKING METHOD USING CARRIER DECHUCKING SYSTEM simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
CARRIER DECHUCKING SYSTEM AND CARRIER DECHUCKING METHOD USING CARRIER DECHUCKING SYSTEM
Organization Name
Inventor(s)
Kyoungran Kim of Suwon-si (KR)
Kwanghyeon Jeong of Suwon-si (KR)
Seongbeom Lee of Suwon-si (KR)
CARRIER DECHUCKING SYSTEM AND CARRIER DECHUCKING METHOD USING CARRIER DECHUCKING SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18542172 titled 'CARRIER DECHUCKING SYSTEM AND CARRIER DECHUCKING METHOD USING CARRIER DECHUCKING SYSTEM
The patent application describes a carrier dechucking system for handling work carriers in a manufacturing process.
- Work carrier consists of a substrate with a support film attached and a ring frame.
- Placement table with support surface and lifting pins for moving the work carrier.
- Ionizer to remove static electricity from the support film.
- Controller to control movement of the work carrier and operation of the ionizer.
- Surface voltage of the substrate lower than the support film at certain levels.
Potential Applications: - Semiconductor manufacturing - Electronics assembly - Optics production
Problems Solved: - Prevents damage to delicate substrates - Ensures proper handling of work carriers - Reduces static electricity interference
Benefits: - Improved product quality - Increased manufacturing efficiency - Enhanced safety for delicate materials
Commercial Applications: Title: Advanced Work Carrier Handling System for High-Tech Manufacturing This technology can be used in industries such as semiconductor, electronics, and optics for precise and safe handling of work carriers, leading to improved production processes and product quality.
Questions about the technology: 1. How does the ionizer help in removing static electricity from the support film?
- The ionizer emits ions that neutralize the static charge on the support film, preventing damage to the substrate.
2. What are the key advantages of controlling the surface voltage of the substrate in the dechucking process?
- By maintaining a lower surface voltage on the substrate, the system ensures proper handling and prevents electrostatic discharge issues.
Original Abstract Submitted
A carrier dechucking system includes a work carrier including a substrate having a first surface, an opposite second surface with a support film attached, and a ring frame surrounding the substrate. The work carrier is placed on a placement table having a support surface on which a lower surface of the support film is maintained, lifting pins configured to move the work carrier, an ionizer configured to eject ions to the lower surface, and a controller. The controller is configured to control the lifting pins to move the work carrier from the support surface to first and second levels, and to control the ionizer to remove static electricity charged on the support film from the support surface to the first level. At the first level, a surface voltage of the first surface of the substrate is lower than a surface voltage of the lower surface of the support film.
