18622596. Plasma Processing Apparatus simplified abstract (Tokyo Electron Limited)
Contents
Plasma Processing Apparatus
Organization Name
Inventor(s)
Kazushi Kaneko of Yamanashi (JP)
Plasma Processing Apparatus - A simplified explanation of the abstract
This abstract first appeared for US patent application 18622596 titled 'Plasma Processing Apparatus
The abstract describes a plasma processing apparatus with a resonator array structure for plasma excitation.
- The apparatus includes a processing chamber, an electromagnetic wave generator, a dielectric, an electromagnetic wave supply, and a resonator array structure.
- The electromagnetic wave generator produces electromagnetic waves for plasma excitation in the processing space.
- The dielectric faces the processing space and the electromagnetic wave supply delivers the waves through the dielectric.
- The resonator array structure, located on the dielectric's surface, consists of small resonators resonating with magnetic field components of the waves.
- The resonators are arranged along the dielectric's surface and the supply provides magnetic field components perpendicular to the resonator plane.
Potential Applications: - Semiconductor manufacturing - Thin film deposition - Surface treatment processes
Problems Solved: - Enhanced plasma excitation efficiency - Improved uniformity in plasma processing - Increased control over plasma parameters
Benefits: - Higher processing speeds - Better quality of processed materials - Energy efficiency in plasma processing
Commercial Applications: Title: Advanced Plasma Processing Apparatus for Semiconductor Manufacturing This technology can revolutionize semiconductor manufacturing processes by improving efficiency and quality, leading to cost savings and enhanced product performance in the electronics industry.
Questions about Plasma Processing Apparatus: 1. How does the resonator array structure improve plasma excitation efficiency? The resonator array structure enhances plasma excitation by resonating with magnetic field components of the electromagnetic waves, leading to more effective energy transfer to the plasma.
2. What are the key advantages of using electromagnetic waves for plasma excitation in this apparatus? Electromagnetic waves offer precise control over plasma parameters, leading to improved processing uniformity and efficiency compared to traditional methods.
Original Abstract Submitted
A plasma processing apparatus comprises a processing chamber having a processing space, an electromagnetic wave generator configured to generate electromagnetic waves for plasma excitation to be supplied to the processing space, a dielectric having a first surface facing the processing space, an electromagnetic wave supply configured to supply the electromagnetic waves to the processing space via the dielectric, and a resonator array structure disposed along the first surface of the dielectric in the processing chamber. The resonator array structure includes a plurality of resonators resonating with magnetic field components of the electromagnetic waves, having a size smaller than a wavelength of the electromagnetic waves, and arranged in a direction along the first surface of the dielectric. The electromagnetic wave supply is configured to supply magnetic field components perpendicular to a plane on which the plurality of resonators are arranged.
