18206456. ELECTRICAL BREAK FOR SUBSTRATE PROCESSING SYSTEMS simplified abstract (Applied Materials, Inc.)
Contents
ELECTRICAL BREAK FOR SUBSTRATE PROCESSING SYSTEMS
Organization Name
Inventor(s)
Yogananda Sarode Vishwanath of Bangalore (IN)
Andrew Nguyen of San Jose CA (US)
Tom K. Cho of Los Altos Hills CA (US)
ELECTRICAL BREAK FOR SUBSTRATE PROCESSING SYSTEMS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18206456 titled 'ELECTRICAL BREAK FOR SUBSTRATE PROCESSING SYSTEMS
Simplified Explanation: The patent application describes a gas break structure used in semiconductor processing systems, designed to provide a specified impedance between a grounded gas distribution manifold and an electrically charged gas delivery nozzle.
Key Features and Innovation:
- Gas break structure made of insulating material with gas flow paths.
- Internal structure with specified geometry and repeating structure.
- Additive manufacturing used to create the gas break.
Potential Applications: The technology can be applied in semiconductor manufacturing, specifically in gas delivery systems for processing.
Problems Solved: The gas break structure addresses the need for a specified impedance in gas delivery systems to prevent electrical discharge.
Benefits:
- Improved safety in semiconductor processing.
- Enhanced control over gas flow in the system.
Commercial Applications: Gas break structures can be used in semiconductor fabrication facilities to ensure safe and efficient gas delivery in processing systems.
Prior Art: Readers can explore prior patents related to gas break structures in semiconductor processing systems to understand the evolution of this technology.
Frequently Updated Research: Stay informed about the latest developments in gas break structures for semiconductor processing systems to keep up with advancements in the field.
Questions about Gas Break Structures: 1. What are the key components of a gas break structure? 2. How does the geometry of the internal structure impact the performance of the gas break?
Original Abstract Submitted
Systems, methods, and apparatus including designs embodied in machine-readable media for a gas break used in semiconductor processing systems. The apparatus includes a gas break structure comprising an insulating material and having one or more gas flow paths formed within a body of the gas break structure, the gas break structure configured to provide a specified impedance when coupled between a grounded gas distribution manifold and an electrically charged gas delivery nozzle, the gas break structure further comprising an internal structure having a specified geometry comprising a repeating structure and one or more empty gaps between elements of the repeating structure. The gas break can be formed using additive manufacturing.
