18132861. SYSTEMS, APPARATUS, AND METHODS FOR MONITORING PLATE TEMPERATURE FOR SEMICONDUCTOR MANUFACTURING simplified abstract (Applied Materials, Inc.)
Contents
SYSTEMS, APPARATUS, AND METHODS FOR MONITORING PLATE TEMPERATURE FOR SEMICONDUCTOR MANUFACTURING
Organization Name
Inventor(s)
Zhepeng Cong of San Jose CA (US)
Nimrod Smith of Cupertino CA (US)
Ashur J. Atanos of San Jose CA (US)
Tao Sheng of Santa Clara CA (US)
SYSTEMS, APPARATUS, AND METHODS FOR MONITORING PLATE TEMPERATURE FOR SEMICONDUCTOR MANUFACTURING - A simplified explanation of the abstract
This abstract first appeared for US patent application 18132861 titled 'SYSTEMS, APPARATUS, AND METHODS FOR MONITORING PLATE TEMPERATURE FOR SEMICONDUCTOR MANUFACTURING
The present disclosure pertains to systems, apparatus, and methods for monitoring plate temperature for semiconductor manufacturing. In one or more embodiments, a system for processing substrates and applicable for semiconductor manufacturing includes a chamber body with one or more sidewalls. The system includes a lid and a window, the sidewalls, the window, and the lid at least partially defining an internal volume. The system includes heat sources to heat the internal volume, a substrate support in the internal volume, and optical sensors to detect energy at specific wavelengths.
- System for processing substrates in semiconductor manufacturing
- Chamber body with sidewalls, lid, and window defining internal volume
- Heat sources to heat internal volume
- Substrate support within internal volume
- First optical sensor for energy detection at a wavelength less than 4.0 microns
- Second optical sensor for energy detection at a wavelength less than the first wavelength
Potential Applications: - Semiconductor manufacturing processes - Temperature monitoring in industrial settings
Problems Solved: - Accurate monitoring of plate temperature in semiconductor manufacturing - Ensuring optimal substrate processing conditions
Benefits: - Improved quality control in semiconductor manufacturing - Enhanced efficiency in substrate processing
Commercial Applications: Title: Advanced Plate Temperature Monitoring System for Semiconductor Manufacturing This technology can be used in semiconductor fabrication facilities to ensure precise temperature control during substrate processing, leading to higher quality semiconductor products and increased production efficiency.
Questions about Plate Temperature Monitoring System: 1. How does the system ensure accurate temperature monitoring in semiconductor manufacturing? 2. What are the key advantages of using optical sensors for energy detection in this system?
Original Abstract Submitted
The present disclosure relates to systems, apparatus, and methods for monitoring plate temperature for semiconductor manufacturing. In one or more embodiments, a system for processing substrates and applicable for semiconductor manufacturing includes a chamber body including one or more sidewalls. The system includes a lid and a window, the one or more sidewalls, the window, and the lid at least partially defining an internal volume. The system includes one or more heat sources configured to heat the internal volume, a substrate support disposed in the internal volume, and a first optical sensor configured to detect energy having a first wavelength that is less than 4.0 microns. The system includes a second optical sensor configured to detect energy having a second wavelength that is less than the first wavelength.
