Murata manufacturing co., ltd. (20240343558). DOUBLE LAYER MEMS DEVICES AND METHOD OF MANUFACTURE simplified abstract
Contents
DOUBLE LAYER MEMS DEVICES AND METHOD OF MANUFACTURE
Organization Name
murata manufacturing co., ltd.
Inventor(s)
Petteri Kilpinen of Espoo (FI)
Altti Torkkeli of Tuusula (FI)
DOUBLE LAYER MEMS DEVICES AND METHOD OF MANUFACTURE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240343558 titled 'DOUBLE LAYER MEMS DEVICES AND METHOD OF MANUFACTURE
The patent application describes a device with multiple layers, including a handle layer, suspension structure, patterned poly-si first device layer, seismic elements, insulating layers, patterned mono-si second device layer, moveably suspended seismic elements, and a cap layer forming an enclosure.
- The device includes a handle layer with at least one cavity and suspension structure.
- It features a patterned poly-si first device layer with suspended structural elements.
- A second electrically insulating layer is present, followed by a patterned mono-si second device layer with moveably suspended seismic elements.
- The enclosure is completed with a cap layer, forming walls with the handle and device layers.
- The first and second insulating layers bond the handle and device layers, creating a sturdy structure.
- The device includes seismic elements for motion detection and at least one static and moveable electrode for various applications.
Potential Applications: - Motion detection sensors - Seismic activity monitoring devices - Vibration sensors for industrial machinery - Earthquake early warning systems
Problems Solved: - Enhanced motion detection capabilities - Improved seismic activity monitoring - Increased sensitivity in vibration sensors
Benefits: - Higher accuracy in motion detection - Real-time monitoring of seismic events - Early detection of potential hazards - Improved safety measures in industrial settings
Commercial Applications: Title: Advanced Motion Detection Sensors for Industrial Safety This technology can be used in various industries such as manufacturing, construction, and transportation for ensuring workplace safety and monitoring structural integrity. The market implications include increased demand for advanced sensor technologies in safety-critical environments.
Questions about the technology: 1. How does this device improve upon existing motion detection sensors? 2. What are the specific advantages of using patterned poly-si and mono-si layers in this device?
Original Abstract Submitted
a device is provided that includes a handle layer with at least one cavity and suspension structure, a patterned polycrystalline silicon (poly-si) first device layer, where at least one structural element is suspended by the structure, and may include a seismic element. a second electrically insulating layer is present, followed by a second device layer of patterned single-crystal silicon (mono-si) with at least one moveably suspended seismic element above the first layer. a cap layer finalizes the structure, with the handle layer, device layers, and the cap layer forming an enclosure's walls. the first and second insulating layers bond the handle and device layers. the enclosure includes at least one seismic element from the second device layer, and at least one static and moveable electrode for motion detection or causation, with the static electrode in the first device layer.
