18447196. SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE simplified abstract (SK hynix Inc.)
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SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE
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SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18447196 titled 'SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE
Simplified Explanation:
The semiconductor device described in the abstract includes a word line, a bit line, a variable resistance pattern, and an electrode pattern.
- The word line extends in one direction, while the bit line extends in a different direction that intersects the first direction.
- The variable resistance pattern is located between the word line and the bit line, with different widths in each direction.
- The electrode pattern is positioned between the variable resistance pattern and the bit line, also with varying widths in each direction.
Key Features and Innovation:
- Integration of a variable resistance pattern with different widths in different directions.
- Use of an electrode pattern with varying widths in different directions.
Potential Applications:
The technology could be applied in memory devices, logic circuits, and other semiconductor applications requiring precise control of resistance.
Problems Solved:
- Improved control over resistance values in semiconductor devices.
- Enhanced performance and reliability of memory and logic circuits.
Benefits:
- Increased efficiency and speed in semiconductor operations.
- Enhanced functionality and durability of electronic devices.
Commercial Applications:
Potential commercial applications include memory chips, processors, and other semiconductor components used in consumer electronics, computers, and industrial equipment.
Questions about Semiconductor Devices:
1. How does the variable resistance pattern impact the performance of the semiconductor device? 2. What are the advantages of using an electrode pattern with varying widths in different directions?
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Original Abstract Submitted
A semiconductor device may include a word line that extends in a first direction, a bit line that extends in a second direction that intersects the first direction, a variable resistance pattern that is disposed between the word line and the bit line and that has a first width in the first direction and a second width in the second direction, wherein the first width and the second width are different from each other, and an electrode pattern that is disposed between the variable resistance pattern and the bit line and that has a third width in the first direction and a fourth width in the second direction, wherein the third width and the fourth width are different from each other.
