Canon kabushiki kaisha (20240337964). EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS simplified abstract
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EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS
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EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240337964 titled 'EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS
The abstract describes an exposure apparatus with light-emitting elements controlled by a processor to correct unevenness in light amount for a photosensitive member.
- Light-emitting elements are arranged along a rotation axis for the photosensitive member.
- Processor controls driving of the elements and generates correction data to adjust the number of elements based on correction amounts.
- Image data is corrected according to the correction data provided.
- For pixels with correction amounts exceeding a limit value, the correction data sets a value equal to or smaller than the limit value.
Potential Applications: - Semiconductor manufacturing for lithography processes - Printed circuit board production - Microfabrication in the electronics industry
Problems Solved: - Correcting uneven light distribution for precise exposure - Enhancing image quality in high-precision applications
Benefits: - Improved accuracy in exposure processes - Enhanced image quality and consistency - Increased efficiency in manufacturing processes
Commercial Applications: Title: Advanced Exposure Apparatus for Semiconductor Manufacturing This technology can be utilized in semiconductor fabrication facilities to enhance lithography processes, leading to higher quality and more precise electronic components. The market implications include improved production efficiency and superior product performance.
Prior Art: Researchers can explore prior patents related to exposure apparatuses in semiconductor manufacturing, specifically focusing on technologies aimed at correcting light distribution for photosensitive members.
Frequently Updated Research: Researchers in the field of semiconductor manufacturing continuously explore advancements in exposure apparatus technologies to improve production processes and product quality.
Questions about Exposure Apparatus Technology: 1. How does the correction data impact the overall image quality in the exposure process? - The correction data ensures uniform light distribution, resulting in enhanced image quality and accuracy. 2. What are the key factors influencing the decision to adjust the number of light-emitting elements in the apparatus? - The correction amounts for uneven light distribution determine the need to increase or decrease the number of elements for optimal exposure.
Original Abstract Submitted
an exposure apparatus includes light-emitting elements arranged along a direction of a rotation axis of a photosensitive member and at least one processor. the at least one processor is configured to controls driving of the light-emitting elements, generate correction data for use in increasing or decreasing the number of the light-emitting elements to be turned on based on a correction amount for correcting unevenness in light amount, and correct image data in accordance with a value indicated by the correction data. for a pixel for which the correction amount indicates a value exceeding a predetermined limit value, the correction data indicates a value that is equal to or smaller than the limit value.
